Impact of temporal transistor variations on circuit reliability

Runsheng Wang, Yu Cao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

With the ever-increasing importance of temporal transistor variations during circuit run time and aging, this paper focuses on impacts of the two major temporal effects: the Bias Temperature Instability (BTI) and Random Telegraph Noise (RTN), illustrating their scaling trend, challenges, and potential solutions for future design robustness.

Original languageEnglish (US)
Title of host publication2015 IEEE International Symposium on Circuits and Systems, ISCAS 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages2453-2456
Number of pages4
ISBN (Electronic)9781479983919
DOIs
StatePublished - Jul 27 2015
EventIEEE International Symposium on Circuits and Systems, ISCAS 2015 - Lisbon, Portugal
Duration: May 24 2015May 27 2015

Publication series

NameProceedings - IEEE International Symposium on Circuits and Systems
Volume2015-July
ISSN (Print)0271-4310

Other

OtherIEEE International Symposium on Circuits and Systems, ISCAS 2015
Country/TerritoryPortugal
CityLisbon
Period5/24/155/27/15

Keywords

  • bias temperature instability (BTI)
  • circuit reliability
  • random telegraph noise (RTN)
  • temporal variation

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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