Imaging x-ray multilayer structures using cross-sectional high resolution electron microscopy

Yuanda Cheng, David Smith, Mary Beth Stearns, Daniel G. Stearns

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Mo/Si soft x-ray multilayer films have been imaged in cross section by high resolution electron microscopy and the dependence of important multilayer parameters on imaging conditions has been investigated. Multiple measurements of the widths of the Mo crystalline layers were made from images recorded as part of a through-focal series. The layer thicknesses were found to be insensitive to the focus setting near the Scherzer defocus value (+160 Å to -800 Å). At larger defocus conditions, however, additional Mo fringes were visible so that the Mo crystalline region seemed to become thicker at the expense of the pure Si and interlayer regions. Micrographs recorded with the ML slightly tilted (∼1-2°) from the edge-on orientation suggested thicker Mo and thinner Si and interlayer regions but the apparent bilayer periodicity did not change measurably. The possibility of changes in multilayer structure induced during cross-sectional specimen preparation was also shown. Finally, the results of the image analysis are compared with those obtained from small and large angle x-ray scattering experiments from the same sample.

Original languageEnglish (US)
Pages (from-to)5165-5171
Number of pages7
JournalJournal of Applied Physics
Volume72
Issue number11
DOIs
StatePublished - 1992

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laminates
interlayers
electron microscopy
high resolution
x ray scattering
image analysis
periodic variations
x rays
preparation
cross sections

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Imaging x-ray multilayer structures using cross-sectional high resolution electron microscopy. / Cheng, Yuanda; Smith, David; Stearns, Mary Beth; Stearns, Daniel G.

In: Journal of Applied Physics, Vol. 72, No. 11, 1992, p. 5165-5171.

Research output: Contribution to journalArticle

Cheng, Yuanda ; Smith, David ; Stearns, Mary Beth ; Stearns, Daniel G. / Imaging x-ray multilayer structures using cross-sectional high resolution electron microscopy. In: Journal of Applied Physics. 1992 ; Vol. 72, No. 11. pp. 5165-5171.
@article{e756a6abbbbc4057a8e50d88407362d1,
title = "Imaging x-ray multilayer structures using cross-sectional high resolution electron microscopy",
abstract = "Mo/Si soft x-ray multilayer films have been imaged in cross section by high resolution electron microscopy and the dependence of important multilayer parameters on imaging conditions has been investigated. Multiple measurements of the widths of the Mo crystalline layers were made from images recorded as part of a through-focal series. The layer thicknesses were found to be insensitive to the focus setting near the Scherzer defocus value (+160 {\AA} to -800 {\AA}). At larger defocus conditions, however, additional Mo fringes were visible so that the Mo crystalline region seemed to become thicker at the expense of the pure Si and interlayer regions. Micrographs recorded with the ML slightly tilted (∼1-2°) from the edge-on orientation suggested thicker Mo and thinner Si and interlayer regions but the apparent bilayer periodicity did not change measurably. The possibility of changes in multilayer structure induced during cross-sectional specimen preparation was also shown. Finally, the results of the image analysis are compared with those obtained from small and large angle x-ray scattering experiments from the same sample.",
author = "Yuanda Cheng and David Smith and Stearns, {Mary Beth} and Stearns, {Daniel G.}",
year = "1992",
doi = "10.1063/1.351996",
language = "English (US)",
volume = "72",
pages = "5165--5171",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "11",

}

TY - JOUR

T1 - Imaging x-ray multilayer structures using cross-sectional high resolution electron microscopy

AU - Cheng, Yuanda

AU - Smith, David

AU - Stearns, Mary Beth

AU - Stearns, Daniel G.

PY - 1992

Y1 - 1992

N2 - Mo/Si soft x-ray multilayer films have been imaged in cross section by high resolution electron microscopy and the dependence of important multilayer parameters on imaging conditions has been investigated. Multiple measurements of the widths of the Mo crystalline layers were made from images recorded as part of a through-focal series. The layer thicknesses were found to be insensitive to the focus setting near the Scherzer defocus value (+160 Å to -800 Å). At larger defocus conditions, however, additional Mo fringes were visible so that the Mo crystalline region seemed to become thicker at the expense of the pure Si and interlayer regions. Micrographs recorded with the ML slightly tilted (∼1-2°) from the edge-on orientation suggested thicker Mo and thinner Si and interlayer regions but the apparent bilayer periodicity did not change measurably. The possibility of changes in multilayer structure induced during cross-sectional specimen preparation was also shown. Finally, the results of the image analysis are compared with those obtained from small and large angle x-ray scattering experiments from the same sample.

AB - Mo/Si soft x-ray multilayer films have been imaged in cross section by high resolution electron microscopy and the dependence of important multilayer parameters on imaging conditions has been investigated. Multiple measurements of the widths of the Mo crystalline layers were made from images recorded as part of a through-focal series. The layer thicknesses were found to be insensitive to the focus setting near the Scherzer defocus value (+160 Å to -800 Å). At larger defocus conditions, however, additional Mo fringes were visible so that the Mo crystalline region seemed to become thicker at the expense of the pure Si and interlayer regions. Micrographs recorded with the ML slightly tilted (∼1-2°) from the edge-on orientation suggested thicker Mo and thinner Si and interlayer regions but the apparent bilayer periodicity did not change measurably. The possibility of changes in multilayer structure induced during cross-sectional specimen preparation was also shown. Finally, the results of the image analysis are compared with those obtained from small and large angle x-ray scattering experiments from the same sample.

UR - http://www.scopus.com/inward/record.url?scp=0000218505&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000218505&partnerID=8YFLogxK

U2 - 10.1063/1.351996

DO - 10.1063/1.351996

M3 - Article

VL - 72

SP - 5165

EP - 5171

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 11

ER -