Imaging electron emission from diamond film surfaces: N-doped diamond vs. nanostructured diamond

F. A.M. Köck; J. M. Garguilo; R. J. Nemanich

doi:10.1016/S0925-9635(01)00401-0

Imaging electron emission from diamond film surfaces: N-doped diamond vs. nanostructured diamond

F. A.M. Köck, J. M. Garguilo, R. J. Nemanich

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

This study reports direct imaging of electron emission from two different classes of diamond containing films that were prepared by microwave plasma chemical vapor deposition. These are N-doped, and nanostructured diamond containing films. The electron emission is excited by UV light (photoemission) or by an applied field (field emission). The photo electron emission microscopy (PEEM) of the N-doped films exhibited uniform emission, and upon heating to ~ 700°C, field electron emission microscopy (FEEM) of the films showed similar uniform emission. In contrast, FEEM of the nanostructured films showed high brightness, localized emission sites at room temperature. The results indicate different processes for electron emission from nanostructured and N-doped diamond films.

Original language	English (US)
Pages (from-to)	1714-1718
Number of pages	5
Journal	Diamond and Related Materials
Volume	10
Issue number	9-10
DOIs	https://doi.org/10.1016/S0925-9635(01)00401-0
State	Published - Sep 2001
Externally published	Yes

Keywords

Diamond
Electron emission
N-doped

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
General Chemistry
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

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10.1016/S0925-9635(01)00401-0

Cite this

@article{23bec51e0d6e436db50d47a278532d7a,

title = "Imaging electron emission from diamond film surfaces: N-doped diamond vs. nanostructured diamond",

abstract = "This study reports direct imaging of electron emission from two different classes of diamond containing films that were prepared by microwave plasma chemical vapor deposition. These are N-doped, and nanostructured diamond containing films. The electron emission is excited by UV light (photoemission) or by an applied field (field emission). The photo electron emission microscopy (PEEM) of the N-doped films exhibited uniform emission, and upon heating to ~ 700°C, field electron emission microscopy (FEEM) of the films showed similar uniform emission. In contrast, FEEM of the nanostructured films showed high brightness, localized emission sites at room temperature. The results indicate different processes for electron emission from nanostructured and N-doped diamond films.",

keywords = "Diamond, Electron emission, N-doped",

author = "K{\"o}ck, {F. A.M.} and Garguilo, {J. M.} and Nemanich, {R. J.}",

note = "Funding Information: We gratefully acknowledge the Duke University Free Electron Laser Laboratory where all the Electron Emission Microscopy Experiments were performed. This research was supported through the Frontier Carbon Technology Project and the Japan Fine Ceramics Center, the Office of Naval Research, and PTS Co.",

year = "2001",

month = sep,

doi = "10.1016/S0925-9635(01)00401-0",

language = "English (US)",

volume = "10",

pages = "1714--1718",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier BV",

number = "9-10",

}

TY - JOUR

T1 - Imaging electron emission from diamond film surfaces

T2 - N-doped diamond vs. nanostructured diamond

AU - Köck, F. A.M.

AU - Garguilo, J. M.

AU - Nemanich, R. J.

N1 - Funding Information: We gratefully acknowledge the Duke University Free Electron Laser Laboratory where all the Electron Emission Microscopy Experiments were performed. This research was supported through the Frontier Carbon Technology Project and the Japan Fine Ceramics Center, the Office of Naval Research, and PTS Co.

PY - 2001/9

Y1 - 2001/9

N2 - This study reports direct imaging of electron emission from two different classes of diamond containing films that were prepared by microwave plasma chemical vapor deposition. These are N-doped, and nanostructured diamond containing films. The electron emission is excited by UV light (photoemission) or by an applied field (field emission). The photo electron emission microscopy (PEEM) of the N-doped films exhibited uniform emission, and upon heating to ~ 700°C, field electron emission microscopy (FEEM) of the films showed similar uniform emission. In contrast, FEEM of the nanostructured films showed high brightness, localized emission sites at room temperature. The results indicate different processes for electron emission from nanostructured and N-doped diamond films.

AB - This study reports direct imaging of electron emission from two different classes of diamond containing films that were prepared by microwave plasma chemical vapor deposition. These are N-doped, and nanostructured diamond containing films. The electron emission is excited by UV light (photoemission) or by an applied field (field emission). The photo electron emission microscopy (PEEM) of the N-doped films exhibited uniform emission, and upon heating to ~ 700°C, field electron emission microscopy (FEEM) of the films showed similar uniform emission. In contrast, FEEM of the nanostructured films showed high brightness, localized emission sites at room temperature. The results indicate different processes for electron emission from nanostructured and N-doped diamond films.

KW - Diamond

KW - Electron emission

KW - N-doped

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SN - 0925-9635

VL - 10

SP - 1714

EP - 1718

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 9-10

ER -

Imaging electron emission from diamond film surfaces: N-doped diamond vs. nanostructured diamond

Abstract

Keywords

ASJC Scopus subject areas

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