Imaging electron emission from diamond film surfaces: N-doped diamond vs. nanostructured diamond

F. A M Köck, J. M. Garguilo, Robert Nemanich

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

This study reports direct imaging of electron emission from two different classes of diamond containing films that were prepared by microwave plasma chemical vapor deposition. These are N-doped, and nanostructured diamond containing films. The electron emission is excited by UV light (photoemission) or by an applied field (field emission). The photo electron emission microscopy (PEEM) of the N-doped films exhibited uniform emission, and upon heating to ~ 700°C, field electron emission microscopy (FEEM) of the films showed similar uniform emission. In contrast, FEEM of the nanostructured films showed high brightness, localized emission sites at room temperature. The results indicate different processes for electron emission from nanostructured and N-doped diamond films.

Original languageEnglish (US)
Pages (from-to)1714-1718
Number of pages5
JournalDiamond and Related Materials
Volume10
Issue number9-10
DOIs
StatePublished - Sep 2001
Externally publishedYes

Fingerprint

Diamond
Electron emission
Diamond films
diamond films
electron emission
Diamonds
diamonds
Imaging techniques
field emission
Microscopic examination
microscopy
Photoemission
Ultraviolet radiation
Field emission
Chemical vapor deposition
Luminance
brightness
photoelectric emission
Microwaves
vapor deposition

Keywords

  • Diamond
  • Electron emission
  • N-doped

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Imaging electron emission from diamond film surfaces : N-doped diamond vs. nanostructured diamond. / Köck, F. A M; Garguilo, J. M.; Nemanich, Robert.

In: Diamond and Related Materials, Vol. 10, No. 9-10, 09.2001, p. 1714-1718.

Research output: Contribution to journalArticle

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AB - This study reports direct imaging of electron emission from two different classes of diamond containing films that were prepared by microwave plasma chemical vapor deposition. These are N-doped, and nanostructured diamond containing films. The electron emission is excited by UV light (photoemission) or by an applied field (field emission). The photo electron emission microscopy (PEEM) of the N-doped films exhibited uniform emission, and upon heating to ~ 700°C, field electron emission microscopy (FEEM) of the films showed similar uniform emission. In contrast, FEEM of the nanostructured films showed high brightness, localized emission sites at room temperature. The results indicate different processes for electron emission from nanostructured and N-doped diamond films.

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