III-nitride deep UV laser on sapphire substrate

Xiao Hang Li, Theeradetch Detchprohm, Russell D. Dupuis, Tsung Ting Kao, Shyh Chiang Shen, Md Mahbub Satter, P. Douglas Yoder, Shuo Wang, Yong O. Wei, Hongen Xie, Alec Fischer, Fernando Ponce, Tim Wernicke, Christof Reich, Martin Martens, Michael Kneissl

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Record-low threshold III-nitride deep UV lasers at a wavelength range of 239-256 nm are demonstrated on sapphire substrates, including the first laser on sapphire below 260 nm. This paper will discuss growth, fabrication and characterization of the lasers in detail as well as future direction.

Original languageEnglish (US)
Title of host publication2015 IEEE Photonics Conference, IPC 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages236-237
Number of pages2
ISBN (Print)9781479974658
DOIs
StatePublished - Nov 9 2015
EventIEEE Photonics Conference, IPC 2015 - Reston, United States
Duration: Aug 30 2015Aug 31 2015

Other

OtherIEEE Photonics Conference, IPC 2015
CountryUnited States
CityReston
Period8/30/158/31/15

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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  • Cite this

    Li, X. H., Detchprohm, T., Dupuis, R. D., Kao, T. T., Shen, S. C., Satter, M. M., Yoder, P. D., Wang, S., Wei, Y. O., Xie, H., Fischer, A., Ponce, F., Wernicke, T., Reich, C., Martens, M., & Kneissl, M. (2015). III-nitride deep UV laser on sapphire substrate. In 2015 IEEE Photonics Conference, IPC 2015 (pp. 236-237). [7323746] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IPCon.2015.7323746