Hydrosiloxane modified styrene-diene block copolymer resists

Allen H. Gabor, Eric A. Lehner, Guoping Mao, Christopher K. Ober, Timothy E. Long, Brian A. Schell, Richard C. Tiberio

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations

Abstract

Block copolymers are a class of polymers deserving of more investigation by the resist community. We are investigating styrene-hydrosiloxane modified diene block copolymers which have good properties for use as negative tone, electron sensitive resists. Resolution better than 0. 1 xm, sensitivity of 30 tC/cm2 and contrast of 2.8 have been demonstrated using a poly(styrene)-pentamethyldlisiloxane modified poly(isoprene) block copolymer (PS-b-PDPI). Used in a bilayer resist scheme, PS-b-PDPI has an oxygen RIE selectivity ratio of 42 with respect to poly(imide). A poly(styrene)-heptamethyltrisiloxane modified poly(butadiene) block copolymer (PS-b-HTPB) has an oxygen RIE selectivity ratio of 54 with respect to poly(imide). In a bilayer resist system, using PS-b-PDPI as the imageable layer, patterns of 0.3 pm wide lines and 1.5 pm wide spaces have been transferred through a 1.2 im thick poly(imide) planarizing layer.

Original languageEnglish (US)
Pages (from-to)499-506
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1925
DOIs
StatePublished - Sep 15 1993
EventAdvances in Resist Technology and Processing X 1993 - San Jose, United States
Duration: Feb 28 1993Mar 5 1993

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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