Homoepitaxial growth of (0 0 0 1)- and (0 0 0 1̄) -oriented ZnO thin films via metalorganic vapor-phase epitaxy and their characterization

T. P. Smith, H. McLean, David Smith, R. F. Davis

Research output: Contribution to journalArticlepeer-review

34 Scopus citations

Abstract

Homoepitaxial ZnO films have been grown via metalorganic vapor-phase epitaxy on O- and Zn-terminated basal-plane-oriented ZnO substrates. Maps of on-axis X-ray rocking curves obtained over 2-in-diameter ZnO{0001} wafers, diced from boules produced by vapor phase transport, revealed well-defined areas that ranged from <50 to >1050arcsec FWHM, indicating the presence of tilted domains. This macrostructure was manifested in all the homoepitaxial ZnO films deposited on these wafers. The films grown on O-terminated ZnO surfaces were initially dense. However, they changed to a textured polycrystalline microstructure after ≈100nm and possessed a surface roughness of 7.3nm. By contrast, the films grown on the Zn-terminated surface under the same conditions were fully dense, without texture and appeared to be monocrystalline with a significantly improved surface roughness of 3.4nm. Cross-sectional transmission electron microscopy of the wafers revealed high densities of edge dislocations and stacking faults with associated Frank partial dislocations.

Original languageEnglish (US)
Pages (from-to)390-398
Number of pages9
JournalJournal of Crystal Growth
Volume265
Issue number3-4
DOIs
StatePublished - May 1 2004

Keywords

  • A1. Crystal morphology
  • A1. Dislocations
  • A1. Stacking faults
  • A1. X-ray diffraction
  • A3. Organometallic vapor phase deposition
  • B1. ZnO

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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