High spatial resolution tem study of thin film metal/6h-SIC interfaces

J. S. Bow, L. M. Porter, M. J. Kim, Ray Carpenter, R. F. Davis

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    3 Scopus citations

    Abstract

    Thin films of titanium, platinum, and hafnium were deposited on single crystal n-type, (0001) 6H-SiC at room temperature in UHV. Microstructure and chemistry of their interfaces were analyzed by high spatial resolution TEM imaging and spectroscopy. Ti5Si3 and TiC were the two phases found in the reaction zone of Ti/SiC specimens annealed at 700°C. A carbon-containing amorphous layer formed between Pt and SiC when the annealing temperature went up to 750°C. There was no apparent reaction zone in Hf/SiC specimens annealed at 700°C for 60 min.. The change of electrical properties of metal/6H-SiC devices was attributed to these new product phases.

    Original languageEnglish (US)
    Title of host publicationEvolution of Surface and Thin Film Microstructure
    EditorsHarry A. Atwater, Eric Chason, Marcia H. Grabow, Max G. Lagally
    PublisherPubl by Materials Research Society
    Pages571-576
    Number of pages6
    ISBN (Print)1558991751
    StatePublished - 1993
    EventProceedings of the 1992 Fall Meeting of the Materials Research Society - Boston, MA, USA
    Duration: Nov 30 1992Dec 4 1992

    Publication series

    NameMaterials Research Society Symposium Proceedings
    Volume280
    ISSN (Print)0272-9172

    Other

    OtherProceedings of the 1992 Fall Meeting of the Materials Research Society
    CityBoston, MA, USA
    Period11/30/9212/4/92

    ASJC Scopus subject areas

    • General Materials Science
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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