High-resolution TEM and the application of direct and indirect aberration correction

Crispin J D Hetherington, Lan-Yun Chang, Sarah Haigh, Peter D. Nellist, Lionel Cervera Gontard, Rafal E. Dunin-Borkowski, Angus I. Kirkland

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Aberration correction leads to a substantial improvement in the directly interpretable resolution of transmission electron microscopes. Correction of the aberrations has been achieved electron-optically through a hexapole-based corrector and also indirectly by computational analysis of a focal or tilt series of images. These direct and indirect methods are complementary, and a combination of the two offers further advantages. Materials characterization has benefitted from the reduced delocalization and higher resolution in the corrected images. It is now possible, for example, to locate atomic columns at surfaces to higher accuracy and reliability. This article describes the JEM-2200FS in Oxford, which is equipped with correctors for both the image-forming and probe-forming lenses. Examples of the use of this instrument in the characterization of nanocrystalline catalysts are given together with initial results combining direct and indirect methods. The double corrector configuration enables direct imaging of the corrected probe, and a potential confocal imaging mode is described. Finally, modifications to a second generation instrument are outlined.

Original languageEnglish (US)
Pages (from-to)60-67
Number of pages8
JournalMicroscopy and Microanalysis
Volume14
Issue number1
DOIs
StatePublished - Feb 1 2008
Externally publishedYes

Fingerprint

Aberrations
aberration
Transmission electron microscopy
Imaging techniques
transmission electron microscopy
high resolution
Lenses
Electron microscopes
probes
Catalysts
Electrons
electron microscopes
lenses
catalysts
configurations
electrons

Keywords

  • Aberration correction
  • Confocal imaging
  • Exit-wavefunction reconstruction
  • Nanocrystalline catalysis

ASJC Scopus subject areas

  • Instrumentation

Cite this

Hetherington, C. J. D., Chang, L-Y., Haigh, S., Nellist, P. D., Gontard, L. C., Dunin-Borkowski, R. E., & Kirkland, A. I. (2008). High-resolution TEM and the application of direct and indirect aberration correction. Microscopy and Microanalysis, 14(1), 60-67. https://doi.org/10.1017/S1431927608080148

High-resolution TEM and the application of direct and indirect aberration correction. / Hetherington, Crispin J D; Chang, Lan-Yun; Haigh, Sarah; Nellist, Peter D.; Gontard, Lionel Cervera; Dunin-Borkowski, Rafal E.; Kirkland, Angus I.

In: Microscopy and Microanalysis, Vol. 14, No. 1, 01.02.2008, p. 60-67.

Research output: Contribution to journalArticle

Hetherington, CJD, Chang, L-Y, Haigh, S, Nellist, PD, Gontard, LC, Dunin-Borkowski, RE & Kirkland, AI 2008, 'High-resolution TEM and the application of direct and indirect aberration correction', Microscopy and Microanalysis, vol. 14, no. 1, pp. 60-67. https://doi.org/10.1017/S1431927608080148
Hetherington, Crispin J D ; Chang, Lan-Yun ; Haigh, Sarah ; Nellist, Peter D. ; Gontard, Lionel Cervera ; Dunin-Borkowski, Rafal E. ; Kirkland, Angus I. / High-resolution TEM and the application of direct and indirect aberration correction. In: Microscopy and Microanalysis. 2008 ; Vol. 14, No. 1. pp. 60-67.
@article{db9e167513a7492790223b5ebedc825f,
title = "High-resolution TEM and the application of direct and indirect aberration correction",
abstract = "Aberration correction leads to a substantial improvement in the directly interpretable resolution of transmission electron microscopes. Correction of the aberrations has been achieved electron-optically through a hexapole-based corrector and also indirectly by computational analysis of a focal or tilt series of images. These direct and indirect methods are complementary, and a combination of the two offers further advantages. Materials characterization has benefitted from the reduced delocalization and higher resolution in the corrected images. It is now possible, for example, to locate atomic columns at surfaces to higher accuracy and reliability. This article describes the JEM-2200FS in Oxford, which is equipped with correctors for both the image-forming and probe-forming lenses. Examples of the use of this instrument in the characterization of nanocrystalline catalysts are given together with initial results combining direct and indirect methods. The double corrector configuration enables direct imaging of the corrected probe, and a potential confocal imaging mode is described. Finally, modifications to a second generation instrument are outlined.",
keywords = "Aberration correction, Confocal imaging, Exit-wavefunction reconstruction, Nanocrystalline catalysis",
author = "Hetherington, {Crispin J D} and Lan-Yun Chang and Sarah Haigh and Nellist, {Peter D.} and Gontard, {Lionel Cervera} and Dunin-Borkowski, {Rafal E.} and Kirkland, {Angus I.}",
year = "2008",
month = "2",
day = "1",
doi = "10.1017/S1431927608080148",
language = "English (US)",
volume = "14",
pages = "60--67",
journal = "Microscopy and Microanalysis",
issn = "1431-9276",
publisher = "Cambridge University Press",
number = "1",

}

TY - JOUR

T1 - High-resolution TEM and the application of direct and indirect aberration correction

AU - Hetherington, Crispin J D

AU - Chang, Lan-Yun

AU - Haigh, Sarah

AU - Nellist, Peter D.

AU - Gontard, Lionel Cervera

AU - Dunin-Borkowski, Rafal E.

AU - Kirkland, Angus I.

PY - 2008/2/1

Y1 - 2008/2/1

N2 - Aberration correction leads to a substantial improvement in the directly interpretable resolution of transmission electron microscopes. Correction of the aberrations has been achieved electron-optically through a hexapole-based corrector and also indirectly by computational analysis of a focal or tilt series of images. These direct and indirect methods are complementary, and a combination of the two offers further advantages. Materials characterization has benefitted from the reduced delocalization and higher resolution in the corrected images. It is now possible, for example, to locate atomic columns at surfaces to higher accuracy and reliability. This article describes the JEM-2200FS in Oxford, which is equipped with correctors for both the image-forming and probe-forming lenses. Examples of the use of this instrument in the characterization of nanocrystalline catalysts are given together with initial results combining direct and indirect methods. The double corrector configuration enables direct imaging of the corrected probe, and a potential confocal imaging mode is described. Finally, modifications to a second generation instrument are outlined.

AB - Aberration correction leads to a substantial improvement in the directly interpretable resolution of transmission electron microscopes. Correction of the aberrations has been achieved electron-optically through a hexapole-based corrector and also indirectly by computational analysis of a focal or tilt series of images. These direct and indirect methods are complementary, and a combination of the two offers further advantages. Materials characterization has benefitted from the reduced delocalization and higher resolution in the corrected images. It is now possible, for example, to locate atomic columns at surfaces to higher accuracy and reliability. This article describes the JEM-2200FS in Oxford, which is equipped with correctors for both the image-forming and probe-forming lenses. Examples of the use of this instrument in the characterization of nanocrystalline catalysts are given together with initial results combining direct and indirect methods. The double corrector configuration enables direct imaging of the corrected probe, and a potential confocal imaging mode is described. Finally, modifications to a second generation instrument are outlined.

KW - Aberration correction

KW - Confocal imaging

KW - Exit-wavefunction reconstruction

KW - Nanocrystalline catalysis

UR - http://www.scopus.com/inward/record.url?scp=38349177507&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=38349177507&partnerID=8YFLogxK

U2 - 10.1017/S1431927608080148

DO - 10.1017/S1431927608080148

M3 - Article

C2 - 18171500

AN - SCOPUS:38349177507

VL - 14

SP - 60

EP - 67

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

SN - 1431-9276

IS - 1

ER -