High resolution electron microscopy of surfaces and surface reactions

David Smith; J. O. Bovin; L. A. Bursill; A. K. Petford-Long; H. Q. Ye

doi:10.1002/sia.740100213

High resolution electron microscopy of surfaces and surface reactions

David Smith, J. O. Bovin, L. A. Bursill, A. K. Petford-Long, H. Q. Ye

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

A 400 kV high‐resolution electron microscope has been used in the surface profile imaging mode to observe surfaces and surface reactions directly in real time. The processes studied include: the formation of surface oxides on Pd and Ag and on In‐compound semiconductors; surface reduction and metallization, diffusion and accretion on oxide surfaces; and structural rearrangements in small metal particles. It is concluded that the technique can provide unique information about surface phenomena.

Original language	English (US)
Pages (from-to)	135-141
Number of pages	7
Journal	Surface and Interface Analysis
Volume	10
Issue number	2-3
DOIs	https://doi.org/10.1002/sia.740100213
State	Published - Mar 1987

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1002/sia.740100213

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title = "High resolution electron microscopy of surfaces and surface reactions",

abstract = "A 400 kV high‐resolution electron microscope has been used in the surface profile imaging mode to observe surfaces and surface reactions directly in real time. The processes studied include: the formation of surface oxides on Pd and Ag and on In‐compound semiconductors; surface reduction and metallization, diffusion and accretion on oxide surfaces; and structural rearrangements in small metal particles. It is concluded that the technique can provide unique information about surface phenomena.",

author = "David Smith and Bovin, {J. O.} and Bursill, {L. A.} and Petford-Long, {A. K.} and Ye, {H. Q.}",

year = "1987",

month = mar,

doi = "10.1002/sia.740100213",

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AU - Smith, David

AU - Bovin, J. O.

AU - Bursill, L. A.

AU - Petford-Long, A. K.

AU - Ye, H. Q.

PY - 1987/3

Y1 - 1987/3

N2 - A 400 kV high‐resolution electron microscope has been used in the surface profile imaging mode to observe surfaces and surface reactions directly in real time. The processes studied include: the formation of surface oxides on Pd and Ag and on In‐compound semiconductors; surface reduction and metallization, diffusion and accretion on oxide surfaces; and structural rearrangements in small metal particles. It is concluded that the technique can provide unique information about surface phenomena.

AB - A 400 kV high‐resolution electron microscope has been used in the surface profile imaging mode to observe surfaces and surface reactions directly in real time. The processes studied include: the formation of surface oxides on Pd and Ag and on In‐compound semiconductors; surface reduction and metallization, diffusion and accretion on oxide surfaces; and structural rearrangements in small metal particles. It is concluded that the technique can provide unique information about surface phenomena.

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DO - 10.1002/sia.740100213

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ER -

High resolution electron microscopy of surfaces and surface reactions

Abstract

ASJC Scopus subject areas

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