High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering

Aritra Dhar; Terry Alford

doi:10.1063/1.4808438

High quality transparent TiO₂/Ag/TiO₂ composite electrode films deposited on flexible substrate at room temperature by sputtering

Aritra Dhar, Terry Alford

Research output: Contribution to journal › Article › peer-review

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Abstract

Multilayer structures of TiO₂/Ag/TiO₂ have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (t_c) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for t_c has one of the highest FOMs with 61.4 × 10^-3 Ω^-1/sq.

Original language	English (US)
Article number	012102
Journal	APL Materials
Volume	1
Issue number	1
DOIs	https://doi.org/10.1063/1.4808438
State	Published - Jul 2013

ASJC Scopus subject areas

Materials Science(all)
Engineering(all)

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abstract = "Multilayer structures of TiO2/Ag/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (tc) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOMs with 61.4 × 10-3 Ω-1/sq.",

author = "Aritra Dhar and Terry Alford",

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T1 - High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering

AU - Dhar, Aritra

AU - Alford, Terry

N1 - Funding Information: This work was partially supported by the National Science Foundation (C. Ying, Grant No. DMR-0902277) to whom the authors are greatly indebted.

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AB - Multilayer structures of TiO2/Ag/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (tc) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOMs with 61.4 × 10-3 Ω-1/sq.

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High quality transparent TiO₂/Ag/TiO₂ composite electrode films deposited on flexible substrate at room temperature by sputtering

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