Abstract
This paper focuses on the metal-organic vapor-phase epitaxy growth of 3-junction (3J) solar cells where the epitaxial Ga0.44In 0.56P top and Ga0.92In0.08As middle subcells are grown lattice-mismatched on a Ge substrate. Single-junction metamorphic devices with 8% and 12%-In, GaInAs are grown on 100 mm dia. (001) Ge substrates and evaluated in comparison to approximately lattice-matched GaAs and Ga 0.99In0.01As subcells. Layers are observed to be nearly 100% relaxed by high-resolution X-ray diffraction. Threading dislocation densities of ∼2 × 105cm-2 in the 8%-In layers are observed by electron beam induced current and cathodoluminescence. Single-junction devices show a constant offset between open-circuit voltage and bandgap of ∼380 mV. Building upon these results, 3J metamorphic Ga 0.44In0.56P/Ga0.92In0.08As/Ge solar cells are fabricated. Very high performances of small area devices are reported with 28.8% efficiency under the AM0 spectrum and 31.3% efficiency under the AM1.5G 1-sun terrestrial spectrum.
Original language | English (US) |
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Pages (from-to) | 341-348 |
Number of pages | 8 |
Journal | Journal of Crystal Growth |
Volume | 261 |
Issue number | 2-3 |
DOIs | |
State | Published - Jan 19 2004 |
Externally published | Yes |
Event | Proceedings of the 11th Biennia, (US) Workshop on Organometall - Keystone, CO, United States Duration: Jul 20 2003 → Jul 24 2003 |
Keywords
- A1. Metamorphic
- A3. Metalorganic vapor phase epitaxy
- B1. GaInAs
- B1. GaInP
- B1. Germanium
- B3. Solar cells
ASJC Scopus subject areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry