Hierarchical modeling and control of re-entrant semiconductor manufacturing facilities

Research output: Chapter in Book/Report/Conference proceedingChapter

36 Scopus citations

Abstract

This paper addresses hierarchical modeling and control issues within a modern semiconductor fabrication facility. It is well known that fabs are appropriately modeled via discrete event systems. Such models, however, are difficult to analyze and even more difficult to use for design purposes. In this paper a new method for modeling the fab is presented. The method leads to models which approximate the fab over small time scales. These models provide synchronous discrete-time approximations which may be useful for analysis and control design. They also provide a natural tool for systematically addressing aggregation/de-aggregation issues. It is also shown how the fab can be approximated by a high-level flow model. Such model is useful for making high-level long term decisions, determining realistic commands for low-level tracking policies, and for assessing achievable performance. A low-level tracking policy is presented and integrated with a high-level state variable feedback policy. The low-level tracking policy is shown to track low-frequency commands generated by the high-level controller.

Original languageEnglish (US)
Title of host publicationProceedings of the IEEE Conference on Decision and Control
Editors Anon
Pages1736-1742
Number of pages7
StatePublished - Dec 1 1996
EventProceedings of the 35th IEEE Conference on Decision and Control. Part 4 (of 4) - Kobe, Jpn
Duration: Dec 11 1996Dec 13 1996

Publication series

NameProceedings of the IEEE Conference on Decision and Control
Volume2
ISSN (Print)0191-2216

Other

OtherProceedings of the 35th IEEE Conference on Decision and Control. Part 4 (of 4)
CityKobe, Jpn
Period12/11/9612/13/96

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Modeling and Simulation
  • Control and Optimization

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