Hierarchical modeling and control for re-entrant semiconductor fabrication lines: A mini-fab benchmark

Konstantinos Tsakalis, Jose Job Flores-Godoy, Armando Rodriguez

Research output: Chapter in Book/Report/Conference proceedingConference contribution

17 Scopus citations

Abstract

This paper addresses the problem of controlling re-entrant semiconductor fabrication lines. To focus the presentation, a virtual five-machine six-step mini-fab is used. This mini-fab - developed by Intel in collaboration with ASU - is intended to contain all of the features which make a real line difficult to control. Industry-like policies are discussed and compared with control-theoretic hierarchical policies.

Original languageEnglish (US)
Title of host publicationIEEE Symposium on Emerging Technologies & Factory Automation, ETFA
Place of PublicationPiscataway, NJ, United States
PublisherIEEE
Pages508-513
Number of pages6
StatePublished - 1997
EventProceedings of the 1997 IEEE 6th International Conference on Emerging Technologies and Factory Automation, ETFA'97 - Los Angeles, CA, USA
Duration: Sep 9 1997Sep 12 1997

Other

OtherProceedings of the 1997 IEEE 6th International Conference on Emerging Technologies and Factory Automation, ETFA'97
CityLos Angeles, CA, USA
Period9/9/979/12/97

ASJC Scopus subject areas

  • General Engineering

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