Hierarchical modeling and control for re-entrant semiconductor fabrication lines: A mini-fab benchmark

Research output: Chapter in Book/Report/Conference proceedingConference contribution

17 Citations (Scopus)

Abstract

This paper addresses the problem of controlling re-entrant semiconductor fabrication lines. To focus the presentation, a virtual five-machine six-step mini-fab is used. This mini-fab - developed by Intel in collaboration with ASU - is intended to contain all of the features which make a real line difficult to control. Industry-like policies are discussed and compared with control-theoretic hierarchical policies.

Original languageEnglish (US)
Title of host publicationIEEE Symposium on Emerging Technologies & Factory Automation, ETFA
Place of PublicationPiscataway, NJ, United States
PublisherIEEE
Pages508-513
Number of pages6
StatePublished - 1997
EventProceedings of the 1997 IEEE 6th International Conference on Emerging Technologies and Factory Automation, ETFA'97 - Los Angeles, CA, USA
Duration: Sep 9 1997Sep 12 1997

Other

OtherProceedings of the 1997 IEEE 6th International Conference on Emerging Technologies and Factory Automation, ETFA'97
CityLos Angeles, CA, USA
Period9/9/979/12/97

Fingerprint

Semiconductor materials
Fabrication
Industry
Virtual machine

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Tsakalis, K., Flores-Godoy, J. J., & Rodriguez, A. (1997). Hierarchical modeling and control for re-entrant semiconductor fabrication lines: A mini-fab benchmark. In IEEE Symposium on Emerging Technologies & Factory Automation, ETFA (pp. 508-513). Piscataway, NJ, United States: IEEE.

Hierarchical modeling and control for re-entrant semiconductor fabrication lines : A mini-fab benchmark. / Tsakalis, Konstantinos; Flores-Godoy, Jose Job; Rodriguez, Armando.

IEEE Symposium on Emerging Technologies & Factory Automation, ETFA. Piscataway, NJ, United States : IEEE, 1997. p. 508-513.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Tsakalis, K, Flores-Godoy, JJ & Rodriguez, A 1997, Hierarchical modeling and control for re-entrant semiconductor fabrication lines: A mini-fab benchmark. in IEEE Symposium on Emerging Technologies & Factory Automation, ETFA. IEEE, Piscataway, NJ, United States, pp. 508-513, Proceedings of the 1997 IEEE 6th International Conference on Emerging Technologies and Factory Automation, ETFA'97, Los Angeles, CA, USA, 9/9/97.
Tsakalis K, Flores-Godoy JJ, Rodriguez A. Hierarchical modeling and control for re-entrant semiconductor fabrication lines: A mini-fab benchmark. In IEEE Symposium on Emerging Technologies & Factory Automation, ETFA. Piscataway, NJ, United States: IEEE. 1997. p. 508-513
Tsakalis, Konstantinos ; Flores-Godoy, Jose Job ; Rodriguez, Armando. / Hierarchical modeling and control for re-entrant semiconductor fabrication lines : A mini-fab benchmark. IEEE Symposium on Emerging Technologies & Factory Automation, ETFA. Piscataway, NJ, United States : IEEE, 1997. pp. 508-513
@inproceedings{880af633e6b7411696966b9fadb2b0be,
title = "Hierarchical modeling and control for re-entrant semiconductor fabrication lines: A mini-fab benchmark",
abstract = "This paper addresses the problem of controlling re-entrant semiconductor fabrication lines. To focus the presentation, a virtual five-machine six-step mini-fab is used. This mini-fab - developed by Intel in collaboration with ASU - is intended to contain all of the features which make a real line difficult to control. Industry-like policies are discussed and compared with control-theoretic hierarchical policies.",
author = "Konstantinos Tsakalis and Flores-Godoy, {Jose Job} and Armando Rodriguez",
year = "1997",
language = "English (US)",
pages = "508--513",
booktitle = "IEEE Symposium on Emerging Technologies & Factory Automation, ETFA",
publisher = "IEEE",

}

TY - GEN

T1 - Hierarchical modeling and control for re-entrant semiconductor fabrication lines

T2 - A mini-fab benchmark

AU - Tsakalis, Konstantinos

AU - Flores-Godoy, Jose Job

AU - Rodriguez, Armando

PY - 1997

Y1 - 1997

N2 - This paper addresses the problem of controlling re-entrant semiconductor fabrication lines. To focus the presentation, a virtual five-machine six-step mini-fab is used. This mini-fab - developed by Intel in collaboration with ASU - is intended to contain all of the features which make a real line difficult to control. Industry-like policies are discussed and compared with control-theoretic hierarchical policies.

AB - This paper addresses the problem of controlling re-entrant semiconductor fabrication lines. To focus the presentation, a virtual five-machine six-step mini-fab is used. This mini-fab - developed by Intel in collaboration with ASU - is intended to contain all of the features which make a real line difficult to control. Industry-like policies are discussed and compared with control-theoretic hierarchical policies.

UR - http://www.scopus.com/inward/record.url?scp=0030687001&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030687001&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0030687001

SP - 508

EP - 513

BT - IEEE Symposium on Emerging Technologies & Factory Automation, ETFA

PB - IEEE

CY - Piscataway, NJ, United States

ER -