Abstract
This paper addresses the problem of controlling re-entrant semiconductor fabrication lines. To focus the presentation, a virtual five-machine six-step mini-fab is used. This mini-fab - developed by Intel in collaboration with ASU - is intended to contain all of the features which make a real line difficult to control. Industry-like policies are discussed and compared with control-theoretic hierarchical policies.
| Original language | English (US) |
|---|---|
| Title of host publication | IEEE Symposium on Emerging Technologies & Factory Automation, ETFA |
| Place of Publication | Piscataway, NJ, United States |
| Publisher | IEEE |
| Pages | 508-513 |
| Number of pages | 6 |
| State | Published - 1997 |
| Event | Proceedings of the 1997 IEEE 6th International Conference on Emerging Technologies and Factory Automation, ETFA'97 - Los Angeles, CA, USA Duration: Sep 9 1997 → Sep 12 1997 |
Other
| Other | Proceedings of the 1997 IEEE 6th International Conference on Emerging Technologies and Factory Automation, ETFA'97 |
|---|---|
| City | Los Angeles, CA, USA |
| Period | 9/9/97 → 9/12/97 |
ASJC Scopus subject areas
- Engineering(all)