Growth of straight silicon nanowires on amorphous substrates with uniform diameter, length, orientation, and location using nanopatterned host-mediated catalyst

Chao Wang, Patrick F. Murphy, Nan Yao, Kevin McIlwrath, Stephen Y. Chou

Research output: Contribution to journalArticle

11 Scopus citations


We report a new approach, termed "growth by nanopatterned host-medicated catalyst" (NHC growth), to solve nonuniformities of Si nanowires (NWs) grown on amorphous substrates. Rather than pure metal catalyst, the NHC uses a mixture of metal catalyst with the material to be grown (i.e., Si), nanopatterns them into desired locations and anneals them. The Si host ensures one catalyst-dot per-growth-site, prevents catalyst-dot break-up, and crystallizes catalyst-dot (hence orientating NWs). The growth results straight silicon NWs on SiO 2 with uniform length and diameter (4% deviation), predetermined locations, preferred orientation, one-wire per-growth-site, and high density; all are 10-100 times better than conventional growth.

Original languageEnglish (US)
Pages (from-to)5247-5251
Number of pages5
JournalNano Letters
Issue number12
StatePublished - Dec 14 2011
Externally publishedYes



  • Si nanowire
  • amorphous substrate
  • growth
  • guided growth
  • host mediation
  • nanoimprint lithography
  • nanopatterned catalyst

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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