Growth and structural characterization of highly oriented sputter-deposited (111), (110), and (100) Co/Cu superlattices

David Smith; A. R. Modak; T. A. Rabedeau; S. S P Parkin

doi:10.1063/1.119942

Growth and structural characterization of highly oriented sputter-deposited (111), (110), and (100) Co/Cu superlattices

David Smith, A. R. Modak, T. A. Rabedeau, S. S P Parkin

Electrical Engineering

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13 Scopus citations

Abstract

Highly oriented, sputter-deposited (111), (110), and (100) Co/Cu superlattices have been grown simultaneously on substrates of Al₂O₃ (sapphire), MgO (110), and (100), respectively, using thin seed layers of Pt or Pd deposited at ∼500 °C. High-resolution electron microscopy and x-ray scattering demonstrate that the films are epitaxial and of excellent crystallinity.

Original language	English (US)
Pages (from-to)	1480-1482
Number of pages	3
Journal	Applied Physics Letters
Volume	71
Issue number	11
DOIs	https://doi.org/10.1063/1.119942
State	Published - Sep 15 1997

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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abstract = "Highly oriented, sputter-deposited (111), (110), and (100) Co/Cu superlattices have been grown simultaneously on substrates of Al2O3 (sapphire), MgO (110), and (100), respectively, using thin seed layers of Pt or Pd deposited at ∼500 °C. High-resolution electron microscopy and x-ray scattering demonstrate that the films are epitaxial and of excellent crystallinity.",

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AU - Parkin, S. S P

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AB - Highly oriented, sputter-deposited (111), (110), and (100) Co/Cu superlattices have been grown simultaneously on substrates of Al2O3 (sapphire), MgO (110), and (100), respectively, using thin seed layers of Pt or Pd deposited at ∼500 °C. High-resolution electron microscopy and x-ray scattering demonstrate that the films are epitaxial and of excellent crystallinity.

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Growth and structural characterization of highly oriented sputter-deposited (111), (110), and (100) Co/Cu superlattices

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