Growth and structural characterization of highly oriented sputter-deposited (111), (110), and (100) Co/Cu superlattices

David Smith, A. R. Modak, T. A. Rabedeau, S. S P Parkin

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Abstract

Highly oriented, sputter-deposited (111), (110), and (100) Co/Cu superlattices have been grown simultaneously on substrates of Al2O3 (sapphire), MgO (110), and (100), respectively, using thin seed layers of Pt or Pd deposited at ∼500 °C. High-resolution electron microscopy and x-ray scattering demonstrate that the films are epitaxial and of excellent crystallinity.

Original languageEnglish (US)
Pages (from-to)1480-1482
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number11
DOIs
StatePublished - Sep 15 1997

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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