Abstract
Near-ultraviolet light emitting diodes (LED 8), based on one monolayer thick InN/GaN multiple quantum wells, were grown by radio-frequency plasma-assisted molecular beam epitaxy. The active region was grown at 685 °C, a temperature where the growth of thick InN layers is not possible. High resolution transmission electron microscopy revealed that the InN well layers were grown pseudomorphically in between the GaN barriers and were characterized by well defined interfaces and uniform thickness. The LED structures exhibited electroluminescence emission at 384 nm, with a FWHM of about 14 nm. The peak emission wavelength was independent of the injection current, indicating the absence of quantum confined Stark effect in these structures. Output optical power of 0.84 mW was measured at 200 mA in a bare die configuration.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1070-1073 |
| Number of pages | 4 |
| Journal | Physica Status Solidi (A) Applications and Materials Science |
| Volume | 205 |
| Issue number | 5 |
| DOIs | |
| State | Published - May 2008 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
- Materials Chemistry