The growth and nanostructure of conformal ruthenium films were studied using liquid-source metallorganic chemical vapor deposition. The deposition of Ru films was carried out on various substrates at a temperature of 250-320°C via the oxygen-assisted pyrolysis. The Ru films exhibited dense and polycrystalline grain structure, with a moderate preference for the (001) orientation.
|Original language||English (US)|
|Number of pages||4|
|Journal||Journal of Applied Physics|
|State||Published - Jul 1 2003|
ASJC Scopus subject areas
- Physics and Astronomy(all)