The growth and nanostructure of conformal ruthenium films were studied using liquid-source metallorganic chemical vapor deposition. The deposition of Ru films was carried out on various substrates at a temperature of 250-320°C via the oxygen-assisted pyrolysis. The Ru films exhibited dense and polycrystalline grain structure, with a moderate preference for the (001) orientation.
ASJC Scopus subject areas
- Physics and Astronomy(all)