Growth and nanostructure of conformai ruthenium films by liquid-source metalorganic chemical vapor deposition

Sandwip Dey, J. Goswami, A. Das, W. Cao, M. Floyd, Ray Carpenter

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

The growth and nanostructure of conformal ruthenium films were studied using liquid-source metallorganic chemical vapor deposition. The deposition of Ru films was carried out on various substrates at a temperature of 250-320°C via the oxygen-assisted pyrolysis. The Ru films exhibited dense and polycrystalline grain structure, with a moderate preference for the (001) orientation.

Original languageEnglish (US)
Pages (from-to)774-777
Number of pages4
JournalJournal of Applied Physics
Volume94
Issue number1
DOIs
StatePublished - Jul 1 2003

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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