Stoichiometric, highly ordered, and smooth ZnO surfaces were produced via exposure to a remote oxygen/He plasma. A 40-nm-thick Ti film was deposited by electron beam evaporation on the entire (0001) face of each ZnO piece. Atomic force microscopy studies revealed a rms surface roughness of 0.2±0.2nm before and after the plasma clean. The best contact behavior was found for plasma-cleaned surfaces that were subsequently cooled to room temperature in the unignited plasma gas and subsequently exposed to the plasma for 30 s.
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)