Gallium nitride epitaxy on silicon: importance of substrate preparation

G. A. Martin, B. N. Sverdlov, A. Botchkarev, H. Morkoc, David Smith, S. C Y Tsen, W. H. Thompson, M. H. Nayfeh

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Scopus citations

Abstract

Hexagonal GaN films grown on non-isomorphic substrates are usually characterized by numerous threading defects which are essentially boundaries between wurtzite GaN domains where the stacking sequences do not align. One origin of these defects is irregularities on the substrate surface such as surface steps. Using Si 〈111〉 substrates and a substrate preparation procedure that makes wide atomically flat terraces, we demonstrate that reduction of these irregularities greatly improves the crystalline and luminescent quality of GaN films grown by plasma-enhanced molecular beam epitaxy. X-ray rocking curve width decreases from over 1 degree to less than 20 minutes, while PL halfwidth decreases from over 15 meV to less than 10 meV.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages67-72
Number of pages6
Volume395
StatePublished - 1996
Externally publishedYes
EventProceedings of the 1995 MRS Fall Meeting - Boston, MA, USA
Duration: Nov 26 1995Dec 1 1995

Other

OtherProceedings of the 1995 MRS Fall Meeting
CityBoston, MA, USA
Period11/26/9512/1/95

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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  • Cite this

    Martin, G. A., Sverdlov, B. N., Botchkarev, A., Morkoc, H., Smith, D., Tsen, S. C. Y., Thompson, W. H., & Nayfeh, M. H. (1996). Gallium nitride epitaxy on silicon: importance of substrate preparation. In Materials Research Society Symposium - Proceedings (Vol. 395, pp. 67-72). Materials Research Society.