Few-layer MoS2 as nitrogen protective barrier

B. Akbali, A. Yanilmaz, A. Tomak, Sefaattin Tongay, C. Celebi, H. Sahin

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We report experimental and theoretical investigations of the observed barrier behavior of few-layer MoS2 against nitrogenation. Owing to its low-strength shearing, low friction coefficient, and high lubricity, MoS2 exhibits the demeanor of a natural N-resistant coating material. Raman spectroscopy is done to determine the coating capability of MoS2 on graphene. Surface morphology of our MoS2/graphene heterostructure is characterized by using optical microscopy, scanning electron microscopy, and atomic force microscopy. In addition, density functional theory-based calculations are performed to understand the energy barrier performance of MoS2 against nitrogenation. The penetration of nitrogen atoms through a defect-free MoS2 layer is prevented by a very high vertical diffusion barrier, indicating that MoS2 can serve as a protective layer for the nitrogenation of graphene. Our experimental and theoretical results show that MoS2 material can be used both as an efficient nanocoating material and as a nanoscale mask for selective nitrogenation of graphene layer.

Original languageEnglish (US)
Article number415706
JournalNanotechnology
Volume28
Issue number41
DOIs
StatePublished - Sep 13 2017

Fingerprint

Graphite
Graphene
Nitrogen
Coatings
Diffusion barriers
Energy barriers
Shearing
Optical microscopy
Density functional theory
Surface morphology
Raman spectroscopy
Heterojunctions
Masks
Atomic force microscopy
Friction
Atoms
Defects
Scanning electron microscopy

Keywords

  • chemical vapor deposition
  • coating performance
  • density functional theory
  • grapheme
  • liquid exfoliation
  • MoS2
  • nitrogen doping

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Akbali, B., Yanilmaz, A., Tomak, A., Tongay, S., Celebi, C., & Sahin, H. (2017). Few-layer MoS2 as nitrogen protective barrier. Nanotechnology, 28(41), [415706]. https://doi.org/10.1088/1361-6528/aa825e

Few-layer MoS2 as nitrogen protective barrier. / Akbali, B.; Yanilmaz, A.; Tomak, A.; Tongay, Sefaattin; Celebi, C.; Sahin, H.

In: Nanotechnology, Vol. 28, No. 41, 415706, 13.09.2017.

Research output: Contribution to journalArticle

Akbali, B, Yanilmaz, A, Tomak, A, Tongay, S, Celebi, C & Sahin, H 2017, 'Few-layer MoS2 as nitrogen protective barrier', Nanotechnology, vol. 28, no. 41, 415706. https://doi.org/10.1088/1361-6528/aa825e
Akbali B, Yanilmaz A, Tomak A, Tongay S, Celebi C, Sahin H. Few-layer MoS2 as nitrogen protective barrier. Nanotechnology. 2017 Sep 13;28(41). 415706. https://doi.org/10.1088/1361-6528/aa825e
Akbali, B. ; Yanilmaz, A. ; Tomak, A. ; Tongay, Sefaattin ; Celebi, C. ; Sahin, H. / Few-layer MoS2 as nitrogen protective barrier. In: Nanotechnology. 2017 ; Vol. 28, No. 41.
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