Factory-wide run-to-run process control

Mark Yelverton, Konstantinos Tsakalis, Kevin Stoddard

Research output: Contribution to journalArticle

Abstract

Run-to-run process control is traditionally applied to select processes. Through advances in process-engineering-friendly software tools, this can be used across wafer fabrication to maintain process repeatability automatically and compensate for upstream process variability, achieve better device yields and speeds, and greatly enhance factory productivity.

Original languageEnglish (US)
JournalSolid State Technology
Volume42
Issue number12
StatePublished - 1999
Externally publishedYes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics

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  • Cite this

    Yelverton, M., Tsakalis, K., & Stoddard, K. (1999). Factory-wide run-to-run process control. Solid State Technology, 42(12).