Fabrication of thin metallic membranes by MOCVD and sputtering

George Xomeritakis, Jerry Lin

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101 Scopus citations

Abstract

Thin (0.1-1.5 μm) Pd and Pd/Ag alloy membranes have been prepared on porous ceramic substrates consisting of a macroporous α-Al2O3 disk coated with a sol-gel derived, mesoporous γ-Al2O3 top layer. Metallorganic chemical vapor deposition (MOCVD) and magnetron sputtering were used to coat the thin metallic membranes employing Pd(II) acetylacetonate and a 75% Pd-25% Ag alloy target, respectively. The gas transport properties of the thin metallic membranes were determined by multicomponent permeation experiments with He, H2 and Ar at 25-300°C and 1 arm total pressure. The H2 permeance and H2: He selectivity were in the range 1.0-2.0 x 10-7 mol m-2s-1Pa-1 and 30-200 at 300°C, respectively. The dependence of H2 permeation rates on membrane thickness and temperature suggest that surface reaction steps are rate-limiting for H2 transport through the thin, ceramic-supported metallic membranes made by MOCVD and sputtering.

Original languageEnglish (US)
Pages (from-to)217-230
Number of pages14
JournalJournal of Membrane Science
Volume133
Issue number2
DOIs
Publication statusPublished - Oct 1 1997
Externally publishedYes

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Keywords

  • Chemical vapor deposition
  • Gas separations
  • Magnetron sputtering
  • Metallic membranes

ASJC Scopus subject areas

  • Filtration and Separation
  • Polymers and Plastics

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