Abstract

We present a method to fabricate well-controlled periodic silicon nanopillars (Si NPs) in hexagonal arrays using silica nanosphere (SNS) lithography (SNL) combined with metal-assisted chemical etching (MaCE). The period of the Si NPs is easily changed by using our silica nanosphere (SNS) spin-coating process, which provides excellent monolayer uniformity and coverage (>95%) over large surface areas. The size of the deposited SNS is adjusted by reactive ion etching (RIE) to produce a target diameter at a fixed period for control of the surface pattern size after a gold metal mask layer deposition. The Si NPs are etched with the MaCE technique following introduction of a Ni interfacial layer between the Si and Au catalyst layer for adhesion and improved lithographical accuracy. The result is a fast, convenient, and large-area applicable Si surface nanolithography technique for accurate and reproducible Si NP fabrication.

Original languageEnglish (US)
Pages (from-to)4018-4023
Number of pages6
JournalLangmuir
Volume31
Issue number13
DOIs
StatePublished - Mar 17 2015

Fingerprint

Nanospheres
Silicon
Silicon Dioxide
Metals
Silica
etching
silicon dioxide
Fabrication
fabrication
Etching
silicon
metals
Nanolithography
Reactive ion etching
Spin coating
Gold
Lithography
coating
Masks
Monolayers

ASJC Scopus subject areas

  • Electrochemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Materials Science(all)
  • Spectroscopy

Cite this

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abstract = "We present a method to fabricate well-controlled periodic silicon nanopillars (Si NPs) in hexagonal arrays using silica nanosphere (SNS) lithography (SNL) combined with metal-assisted chemical etching (MaCE). The period of the Si NPs is easily changed by using our silica nanosphere (SNS) spin-coating process, which provides excellent monolayer uniformity and coverage (>95{\%}) over large surface areas. The size of the deposited SNS is adjusted by reactive ion etching (RIE) to produce a target diameter at a fixed period for control of the surface pattern size after a gold metal mask layer deposition. The Si NPs are etched with the MaCE technique following introduction of a Ni interfacial layer between the Si and Au catalyst layer for adhesion and improved lithographical accuracy. The result is a fast, convenient, and large-area applicable Si surface nanolithography technique for accurate and reproducible Si NP fabrication.",
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N2 - We present a method to fabricate well-controlled periodic silicon nanopillars (Si NPs) in hexagonal arrays using silica nanosphere (SNS) lithography (SNL) combined with metal-assisted chemical etching (MaCE). The period of the Si NPs is easily changed by using our silica nanosphere (SNS) spin-coating process, which provides excellent monolayer uniformity and coverage (>95%) over large surface areas. The size of the deposited SNS is adjusted by reactive ion etching (RIE) to produce a target diameter at a fixed period for control of the surface pattern size after a gold metal mask layer deposition. The Si NPs are etched with the MaCE technique following introduction of a Ni interfacial layer between the Si and Au catalyst layer for adhesion and improved lithographical accuracy. The result is a fast, convenient, and large-area applicable Si surface nanolithography technique for accurate and reproducible Si NP fabrication.

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