Abstract
We present a method to fabricate well-controlled periodic silicon nanopillars (Si NPs) in hexagonal arrays using silica nanosphere (SNS) lithography (SNL) combined with metal-assisted chemical etching (MaCE). The period of the Si NPs is easily changed by using our silica nanosphere (SNS) spin-coating process, which provides excellent monolayer uniformity and coverage (>95%) over large surface areas. The size of the deposited SNS is adjusted by reactive ion etching (RIE) to produce a target diameter at a fixed period for control of the surface pattern size after a gold metal mask layer deposition. The Si NPs are etched with the MaCE technique following introduction of a Ni interfacial layer between the Si and Au catalyst layer for adhesion and improved lithographical accuracy. The result is a fast, convenient, and large-area applicable Si surface nanolithography technique for accurate and reproducible Si NP fabrication.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 4018-4023 |
| Number of pages | 6 |
| Journal | Langmuir |
| Volume | 31 |
| Issue number | 13 |
| DOIs | |
| State | Published - Mar 17 2015 |
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ASJC Scopus subject areas
- Electrochemistry
- Condensed Matter Physics
- Surfaces and Interfaces
- Materials Science(all)
- Spectroscopy
Cite this
Fabrication of periodic silicon nanopillars in a two-dimensional hexagonal array with enhanced control on structural dimension and period. / Choi, Jea Young; Alford, Terry; Honsberg, Christiana.
In: Langmuir, Vol. 31, No. 13, 17.03.2015, p. 4018-4023.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Fabrication of periodic silicon nanopillars in a two-dimensional hexagonal array with enhanced control on structural dimension and period
AU - Choi, Jea Young
AU - Alford, Terry
AU - Honsberg, Christiana
PY - 2015/3/17
Y1 - 2015/3/17
N2 - We present a method to fabricate well-controlled periodic silicon nanopillars (Si NPs) in hexagonal arrays using silica nanosphere (SNS) lithography (SNL) combined with metal-assisted chemical etching (MaCE). The period of the Si NPs is easily changed by using our silica nanosphere (SNS) spin-coating process, which provides excellent monolayer uniformity and coverage (>95%) over large surface areas. The size of the deposited SNS is adjusted by reactive ion etching (RIE) to produce a target diameter at a fixed period for control of the surface pattern size after a gold metal mask layer deposition. The Si NPs are etched with the MaCE technique following introduction of a Ni interfacial layer between the Si and Au catalyst layer for adhesion and improved lithographical accuracy. The result is a fast, convenient, and large-area applicable Si surface nanolithography technique for accurate and reproducible Si NP fabrication.
AB - We present a method to fabricate well-controlled periodic silicon nanopillars (Si NPs) in hexagonal arrays using silica nanosphere (SNS) lithography (SNL) combined with metal-assisted chemical etching (MaCE). The period of the Si NPs is easily changed by using our silica nanosphere (SNS) spin-coating process, which provides excellent monolayer uniformity and coverage (>95%) over large surface areas. The size of the deposited SNS is adjusted by reactive ion etching (RIE) to produce a target diameter at a fixed period for control of the surface pattern size after a gold metal mask layer deposition. The Si NPs are etched with the MaCE technique following introduction of a Ni interfacial layer between the Si and Au catalyst layer for adhesion and improved lithographical accuracy. The result is a fast, convenient, and large-area applicable Si surface nanolithography technique for accurate and reproducible Si NP fabrication.
UR - http://www.scopus.com/inward/record.url?scp=84926443523&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84926443523&partnerID=8YFLogxK
U2 - 10.1021/acs.langmuir.5b00128
DO - 10.1021/acs.langmuir.5b00128
M3 - Article
AN - SCOPUS:84926443523
VL - 31
SP - 4018
EP - 4023
JO - Langmuir
JF - Langmuir
SN - 0743-7463
IS - 13
ER -