Abstract

This work focus the fabrication and passivation of Si nanopillar structure. Si nanopillar structures are fabricated by well controlled silica nanosphere lithography with metal assisted chemical etching (MACE). For high quality passivation, nanopillar structures are cleaned using general Si cleaning process with wet oxidation. The wet oxidation process helps to reduce surface state density of nanopillar structure. Nanopillar structure is passivated using several methods as thermal, wet oxide, a-Si:H, organic and aluminum oxide (Al2O3). Al2O3 passivation shows the highest lifetime and implied open circuit voltage (Voc) as 31.9 μs and 595 mV.

Original languageEnglish (US)
Title of host publication2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1-3
Number of pages3
ISBN (Electronic)9781509056057
DOIs
StatePublished - May 25 2018
Event44th IEEE Photovoltaic Specialist Conference, PVSC 2017 - Washington, United States
Duration: Jun 25 2017Jun 30 2017

Other

Other44th IEEE Photovoltaic Specialist Conference, PVSC 2017
CountryUnited States
CityWashington
Period6/25/176/30/17

Fingerprint

Nanospheres
Passivation
Silicon Dioxide
Lithography
Cleaning
Silica
Fabrication
Oxidation
Oxides
Aluminum Oxide
Surface states
Open circuit voltage
Etching
Metals
Aluminum

Keywords

  • AlO passivation
  • Atomic layer deposition
  • Metal assisted chemical etching
  • Nanopillar
  • Silica nanospheres lithography

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

Cite this

Kim, S., Bowden, S., & Honsberg, C. (2018). Fabrication of nanopillar structure by silica nanosphere lithography and passivation with wet chemical oxidation cleaning. In 2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017 (pp. 1-3). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PVSC.2017.8366687

Fabrication of nanopillar structure by silica nanosphere lithography and passivation with wet chemical oxidation cleaning. / Kim, Sangpyeong; Bowden, Stuart; Honsberg, Christiana.

2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017. Institute of Electrical and Electronics Engineers Inc., 2018. p. 1-3.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, S, Bowden, S & Honsberg, C 2018, Fabrication of nanopillar structure by silica nanosphere lithography and passivation with wet chemical oxidation cleaning. in 2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017. Institute of Electrical and Electronics Engineers Inc., pp. 1-3, 44th IEEE Photovoltaic Specialist Conference, PVSC 2017, Washington, United States, 6/25/17. https://doi.org/10.1109/PVSC.2017.8366687
Kim S, Bowden S, Honsberg C. Fabrication of nanopillar structure by silica nanosphere lithography and passivation with wet chemical oxidation cleaning. In 2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017. Institute of Electrical and Electronics Engineers Inc. 2018. p. 1-3 https://doi.org/10.1109/PVSC.2017.8366687
Kim, Sangpyeong ; Bowden, Stuart ; Honsberg, Christiana. / Fabrication of nanopillar structure by silica nanosphere lithography and passivation with wet chemical oxidation cleaning. 2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017. Institute of Electrical and Electronics Engineers Inc., 2018. pp. 1-3
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