Fabrication of an ultralow-resistance ohmic contact to MWCNT-metal interconnect using graphitic carbon by electron beam-induced deposition (EBID)

Songkil Kim, Dhaval D. Kulkarni, Konrad Rykaczewski, Mathias Henry, Vladimir V. Tsukruk, Andrei G. Fedorov

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

Reduction in contact resistance is one of the foremost challenges for carbon nanotube/graphene nanodevices. In this study, we present a novel fabrication process for low-temperature, Ohmic contact between open-ended multiwalled carbon nanotubes (MWCNTs) and metal interconnects using graphitic carbon deposited via electron beam-induced deposition (EBID). The electrical and structural properties of the contact interface are characterized for making connection to the single (outermost) shell only, as well as to multiple conducting shells of MWCNTs. In addition to establishing the scaling relationship between the carbon contact length and the resulting contact resistance, the magnitude of the contact resistance has been quantified with and without post-deposition thermal annealing. The results indicate that the contact is Ohmic in nature, and ranges from 26.5kΩ for the connection made to the outermost shell of an MWCNT down to just 116 Ω for the multiple-shell connection performed via a process suggested through the EBID process simulations. These results provide a significant advance in application of MWCNTs to future interconnect technologies.

Original languageEnglish (US)
Article number6323037
Pages (from-to)1223-1230
Number of pages8
JournalIEEE Transactions on Nanotechnology
Volume11
Issue number6
DOIs
StatePublished - 2012
Externally publishedYes

Fingerprint

Multiwalled carbon nanotubes (MWCN)
Ohmic contacts
Electron beams
Contact resistance
Fabrication
Carbon
Metals
Graphene
Structural properties
Carbon nanotubes
Electric properties
Annealing
Temperature

Keywords

  • Contact resistances
  • electron beam-induced deposition (EBID)
  • multiwalled carbon nanotube (MWCNT)
  • MWCNT-metal interconnect

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Computer Science Applications

Cite this

Fabrication of an ultralow-resistance ohmic contact to MWCNT-metal interconnect using graphitic carbon by electron beam-induced deposition (EBID). / Kim, Songkil; Kulkarni, Dhaval D.; Rykaczewski, Konrad; Henry, Mathias; Tsukruk, Vladimir V.; Fedorov, Andrei G.

In: IEEE Transactions on Nanotechnology, Vol. 11, No. 6, 6323037, 2012, p. 1223-1230.

Research output: Contribution to journalArticle

Kim, Songkil ; Kulkarni, Dhaval D. ; Rykaczewski, Konrad ; Henry, Mathias ; Tsukruk, Vladimir V. ; Fedorov, Andrei G. / Fabrication of an ultralow-resistance ohmic contact to MWCNT-metal interconnect using graphitic carbon by electron beam-induced deposition (EBID). In: IEEE Transactions on Nanotechnology. 2012 ; Vol. 11, No. 6. pp. 1223-1230.
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