Fabrication of a thin palladium membrane supported in a porous ceramic substrate by chemical vapor deposition

G. Xomeritakis, Jerry Lin

Research output: Contribution to journalArticle

117 Citations (Scopus)

Abstract

A thin, gas-tight palladium (Pd) membrane was prepared by the counter-diffusion chemical vapor deposition (CVD) process employing palladium chloride (PdC12) vapor and H2 as Pd precursors. A disk-shaped, two-layer porous ceramic membrane consisting of a fine-pore γ-Al2O3 top layer and a coarse-pore α-Al2O3 substrate was used as Pd membrane support. A 0.5-1 μm thick metallic membrane was deposited in the γ-Al2O3 top layer very close to its surface, as verified by XRD and SEM with a backscattered electron detector. The most important parameters that affected the CVD process were reaction temperature, reactants concentrations and top layer quality. Deposition of Pd in the γ-Al2O3 top layer resulted in a 100- to 1000-fold reduction in He permeance of the porous substrate. The H2 permeation flux of these membranes was in the range 0.5-1.0 X 10-6 mol m-2 s-1 Pa-1 at 350-450°C. The H2 permeation data suggest that surface reaction steps are rate-limiting for H2 transport through such thin membranes in the temperature range studied.

Original languageEnglish (US)
Pages (from-to)261-272
Number of pages12
JournalJournal of Membrane Science
Volume120
Issue number2
DOIs
StatePublished - Nov 13 1996
Externally publishedYes

Fingerprint

Palladium
Ceramics
palladium
Chemical vapor deposition
vapor deposition
ceramics
membranes
Membranes
Fabrication
fabrication
Substrates
Permeation
Ceramic membranes
porosity
electron counters
Surface reactions
Temperature
surface reactions
Gases
Vapors

Keywords

  • Ceramic membranes
  • Chemical vapor deposition
  • Gas separations
  • Inorganic membranes
  • Metal membranes
  • Palladium membranes

ASJC Scopus subject areas

  • Filtration and Separation
  • Polymers and Plastics

Cite this

Fabrication of a thin palladium membrane supported in a porous ceramic substrate by chemical vapor deposition. / Xomeritakis, G.; Lin, Jerry.

In: Journal of Membrane Science, Vol. 120, No. 2, 13.11.1996, p. 261-272.

Research output: Contribution to journalArticle

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