Fabrication of a thin palladium membrane supported in a porous ceramic substrate by chemical vapor deposition

A thin, gas-tight palladium (Pd) membrane was prepared by the counter-diffusion chemical vapor deposition (CVD) process employing palladium chloride (PdC1₂) vapor and H₂ as Pd precursors. A disk-shaped, two-layer porous ceramic membrane consisting of a fine-pore γ-Al₂O₃ top layer and a coarse-pore α-Al₂O₃ substrate was used as Pd membrane support. A 0.5-1 μm thick metallic membrane was deposited in the γ-Al₂O₃ top layer very close to its surface, as verified by XRD and SEM with a backscattered electron detector. The most important parameters that affected the CVD process were reaction temperature, reactants concentrations and top layer quality. Deposition of Pd in the γ-Al₂O₃ top layer resulted in a 100- to 1000-fold reduction in He permeance of the porous substrate. The H₂ permeation flux of these membranes was in the range 0.5-1.0 X 10^-6 mol m^-2 s^-1 Pa^-1 at 350-450°C. The H₂ permeation data suggest that surface reaction steps are rate-limiting for H₂ transport through such thin membranes in the temperature range studied.