Fabrication of a thin palladium membrane supported in a porous ceramic substrate by chemical vapor deposition

G. Xomeritakis, Y. S. Lin

Research output: Contribution to journalArticle

123 Scopus citations

Abstract

A thin, gas-tight palladium (Pd) membrane was prepared by the counter-diffusion chemical vapor deposition (CVD) process employing palladium chloride (PdC12) vapor and H2 as Pd precursors. A disk-shaped, two-layer porous ceramic membrane consisting of a fine-pore γ-Al2O3 top layer and a coarse-pore α-Al2O3 substrate was used as Pd membrane support. A 0.5-1 μm thick metallic membrane was deposited in the γ-Al2O3 top layer very close to its surface, as verified by XRD and SEM with a backscattered electron detector. The most important parameters that affected the CVD process were reaction temperature, reactants concentrations and top layer quality. Deposition of Pd in the γ-Al2O3 top layer resulted in a 100- to 1000-fold reduction in He permeance of the porous substrate. The H2 permeation flux of these membranes was in the range 0.5-1.0 X 10-6 mol m-2 s-1 Pa-1 at 350-450°C. The H2 permeation data suggest that surface reaction steps are rate-limiting for H2 transport through such thin membranes in the temperature range studied.

Original languageEnglish (US)
Pages (from-to)261-272
Number of pages12
JournalJournal of Membrane Science
Volume120
Issue number2
DOIs
StatePublished - Nov 13 1996
Externally publishedYes

Keywords

  • Ceramic membranes
  • Chemical vapor deposition
  • Gas separations
  • Inorganic membranes
  • Metal membranes
  • Palladium membranes

ASJC Scopus subject areas

  • Biochemistry
  • Materials Science(all)
  • Physical and Theoretical Chemistry
  • Filtration and Separation

Fingerprint Dive into the research topics of 'Fabrication of a thin palladium membrane supported in a porous ceramic substrate by chemical vapor deposition'. Together they form a unique fingerprint.

  • Cite this