Abstract
Using EXAFS and XRD techniques, we have investigated the phase formation of Co/SiGe structures at several annealing temperatures. For the Co/Si0.80Ge0.20 samples annealed from 400°C to 600°C, Co(Si1-yGey) phases with y ∼ 0.10 were identified and the coordination number of Si around Co increases as the annealing temperature increases. For the sample annealed at 700°C, only the CoSi2 phase was formed. These results indicate a preferential CoSi reaction when annealing the Co/SiGe structure.
Original language | English (US) |
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Pages (from-to) | 567-568 |
Number of pages | 2 |
Journal | Physica B: Physics of Condensed Matter |
Volume | 208-209 |
Issue number | C |
DOIs | |
State | Published - Mar 1 1995 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering