Etching parylene-N using a remote oxygen microwave plasma

Russell Callahan; Gregory Raupp; Stephen Beaudoin

doi:10.1116/1.1501584

Etching parylene-N using a remote oxygen microwave plasma

Russell Callahan, Gregory Raupp, Stephen Beaudoin

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

A study was conducted on the etching of thin films of parylene-N in a remote microwave oxygen plasma. Models for the plasma physics and the chemistry in the plasma cavity and delivery tube were assembled and used to interpret the etching results. it was determined that the etch rate passes through a maximum with increasing pressure at 75-125 seem of oxygen gas flow.

Original language	English (US)
Pages (from-to)	1870-1877
Number of pages	8
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	20
Issue number	5
DOIs	https://doi.org/10.1116/1.1501584
State	Published - Sep 1 2002

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

Access to Document

10.1116/1.1501584

Cite this

@article{646bab3d2bb04ebaa6c7d04aa1b1f731,

title = "Etching parylene-N using a remote oxygen microwave plasma",

abstract = "A study was conducted on the etching of thin films of parylene-N in a remote microwave oxygen plasma. Models for the plasma physics and the chemistry in the plasma cavity and delivery tube were assembled and used to interpret the etching results. it was determined that the etch rate passes through a maximum with increasing pressure at 75-125 seem of oxygen gas flow.",

author = "Russell Callahan and Gregory Raupp and Stephen Beaudoin",

year = "2002",

month = sep,

day = "1",

doi = "10.1116/1.1501584",

language = "English (US)",

volume = "20",

pages = "1870--1877",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "5",

}

TY - JOUR

T1 - Etching parylene-N using a remote oxygen microwave plasma

AU - Callahan, Russell

AU - Raupp, Gregory

AU - Beaudoin, Stephen

PY - 2002/9/1

Y1 - 2002/9/1

N2 - A study was conducted on the etching of thin films of parylene-N in a remote microwave oxygen plasma. Models for the plasma physics and the chemistry in the plasma cavity and delivery tube were assembled and used to interpret the etching results. it was determined that the etch rate passes through a maximum with increasing pressure at 75-125 seem of oxygen gas flow.

AB - A study was conducted on the etching of thin films of parylene-N in a remote microwave oxygen plasma. Models for the plasma physics and the chemistry in the plasma cavity and delivery tube were assembled and used to interpret the etching results. it was determined that the etch rate passes through a maximum with increasing pressure at 75-125 seem of oxygen gas flow.

UR - http://www.scopus.com/inward/record.url?scp=0036026348&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036026348&partnerID=8YFLogxK

U2 - 10.1116/1.1501584

DO - 10.1116/1.1501584

M3 - Article

AN - SCOPUS:0036026348

SN - 1071-1023

VL - 20

SP - 1870

EP - 1877

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 5

ER -

Etching parylene-N using a remote oxygen microwave plasma

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this