Etching parylene-N using a remote oxygen microwave plasma

Russell Callahan, Gregory Raupp, Stephen Beaudoin

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

A study was conducted on the etching of thin films of parylene-N in a remote microwave oxygen plasma. Models for the plasma physics and the chemistry in the plasma cavity and delivery tube were assembled and used to interpret the etching results. it was determined that the etch rate passes through a maximum with increasing pressure at 75-125 seem of oxygen gas flow.

Original languageEnglish (US)
Pages (from-to)1870-1877
Number of pages8
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number5
DOIs
StatePublished - Sep 1 2002

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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