A study was conducted on the etching of thin films of parylene-N in a remote microwave oxygen plasma. Models for the plasma physics and the chemistry in the plasma cavity and delivery tube were assembled and used to interpret the etching results. it was determined that the etch rate passes through a maximum with increasing pressure at 75-125 seem of oxygen gas flow.
|Original language||English (US)|
|Number of pages||8|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Sep 1 2002|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering