Error estimated driven anisotropic mesh refinement for three-dimensional diffusion simulation

W. Wessner, C. Heitzinger, A. Hössinger, S. Selberherr

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

We present a computational method for locally adapted conformal anisotropic tetrahedral mesh refinement. The element size is determined by an anisotropy function which is governed by an error estimation driven ruler according to an adjustable maximum error. Anisotropic structures are taken into account to reduce the amount of elements compared to strict isotropic refinement. The spatial resolution in three-dimensional unstructured tetrahedral meshes for diffusion simulation can be dynamically increased.

Original languageEnglish (US)
Title of host publicationSISPAD 2003 - 2003 IEEE International Conference on Simulation of Semiconductor Processes and Devices
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages109-112
Number of pages4
ISBN (Electronic)0780378261
DOIs
StatePublished - Jan 1 2003
Event2003 IEEE International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2003 - Boston, United States
Duration: Sep 3 2003Sep 5 2003

Publication series

NameInternational Conference on Simulation of Semiconductor Processes and Devices, SISPAD
Volume2003-January

Other

Other2003 IEEE International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2003
CountryUnited States
CityBoston
Period9/3/039/5/03

Keywords

  • Anisotropic magnetoresistance
  • Computational modeling
  • Error analysis
  • Extraterrestrial measurements
  • Microelectronics
  • Physics
  • Refining
  • Shape control
  • Spatial resolution
  • Telephony

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Computer Science Applications
  • Modeling and Simulation

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