Erratum: Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302))

S. Ingole; P. Aella; P. Manandhar; S. B. Chikkannanavar; E. A. Akhadov; David Smith; S. T. Picraux

doi:10.1063/1.2958313

Erratum: Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302))

S. Ingole, P. Aella, P. Manandhar, S. B. Chikkannanavar, E. A. Akhadov, David Smith, S. T. Picraux

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English (US)
Article number	039907
Journal	Journal of Applied Physics
Volume	104
Issue number	3
DOIs	https://doi.org/10.1063/1.2958313
State	Published - 2008

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.2958313

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author = "S. Ingole and P. Aella and P. Manandhar and Chikkannanavar, {S. B.} and Akhadov, {E. A.} and David Smith and Picraux, {S. T.}",

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AU - Akhadov, E. A.

AU - Smith, David

AU - Picraux, S. T.

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Erratum: Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302))

ASJC Scopus subject areas

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