Erratum: Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302))

S. Ingole, P. Aella, P. Manandhar, S. B. Chikkannanavar, E. A. Akhadov, David Smith, S. T. Picraux

Research output: Contribution to journalComment/debate

Original languageEnglish (US)
Article number039907
JournalJournal of Applied Physics
Volume104
Issue number3
DOIs
StatePublished - Aug 25 2008

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Ingole, S., Aella, P., Manandhar, P., Chikkannanavar, S. B., Akhadov, E. A., Smith, D., & Picraux, S. T. (2008). Erratum: Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302)). Journal of Applied Physics, 104(3), [039907]. https://doi.org/10.1063/1.2958313