Erratum

Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302))

S. Ingole, P. Aella, P. Manandhar, S. B. Chikkannanavar, E. A. Akhadov, David Smith, S. T. Picraux

Research output: Contribution to journalArticle

Original languageEnglish (US)
Article number039907
JournalJournal of Applied Physics
Volume104
Issue number3
DOIs
StatePublished - 2008

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boron
nanowires
physics
silicon

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Ingole, S., Aella, P., Manandhar, P., Chikkannanavar, S. B., Akhadov, E. A., Smith, D., & Picraux, S. T. (2008). Erratum: Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302)). Journal of Applied Physics, 104(3), [039907]. https://doi.org/10.1063/1.2958313

Erratum : Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302)). / Ingole, S.; Aella, P.; Manandhar, P.; Chikkannanavar, S. B.; Akhadov, E. A.; Smith, David; Picraux, S. T.

In: Journal of Applied Physics, Vol. 104, No. 3, 039907, 2008.

Research output: Contribution to journalArticle

Ingole, S, Aella, P, Manandhar, P, Chikkannanavar, SB, Akhadov, EA, Smith, D & Picraux, ST 2008, 'Erratum: Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302))', Journal of Applied Physics, vol. 104, no. 3, 039907. https://doi.org/10.1063/1.2958313
Ingole, S. ; Aella, P. ; Manandhar, P. ; Chikkannanavar, S. B. ; Akhadov, E. A. ; Smith, David ; Picraux, S. T. / Erratum : Ex situ doping of silicon nanowires with boron (Journal of Applied Physics (2008) 103 (104302)). In: Journal of Applied Physics. 2008 ; Vol. 104, No. 3.
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