Epitaxial strontium titanate films grown by atomic layer deposition on SrTiO₃-buffered Si(001) substrates

Engineering & Materials Science

• Strontium titanates 100%
• Atomic layer deposition 81%
• Substrates 37%
• Molecular beam epitaxy 25%
• Photoelectron spectroscopy 21%
• Crystalline materials 12%
• Buffer layers 11%
• X rays 11%
• Annealing 8%
• Carbon 6%
• Full width at half maximum 6%
• Strontium 5%
• Temperature 4%
• Film thickness 4%
• Transmission electron microscopy 4%
• X ray diffraction 4%
• Titanium 3%
• Vacuum 3%
• Water 2%

Physics & Astronomy

• strontium titanates 66%
• atomic layer epitaxy 55%
• molecular beam epitaxy 13%
• x ray spectroscopy 12%
• photoelectron spectroscopy 10%
• templates 7%
• buffers 6%
• carbon 5%
• annealing 4%
• strontium 4%
• high vacuum 4%
• temperature 3%
• titanium 3%
• film thickness 3%
• transmission electron microscopy 2%
• water 2%
• curves 2%
• diffraction 2%
• x rays 1%

Chemical Compounds

• Atomic Layer Epitaxy 61%
• Liquid Film 25%
• Molecular Beam Epitaxy 17%
• Photoelectron Spectroscopy 12%
• Annealing 6%
• Amorphous Material 5%
• Buffer Solution 5%
• Molecular Beam 4%
• Deposition Process 4%
• Carbon Atom 3%
• Vacuum 3%
• Reflection 3%
• Transmission Electron Microscopy 2%
• Surface 2%
• X-Ray Diffraction 2%