Abstract
The growth of metallic and reflecting ZrB2 films was conducted on Si(111) substrates at 900 °C using a single-source unimolecular precursor Zr(BH4)4. The ZrB2 buffer layer on Si(111) provided a near lattice-matched template for the growth of epitaxial GaN. The reflective nature of the ZrB2 surface presented an added bonus to optoelectronic applications of the 111- nitrides.
Original language | English (US) |
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Pages (from-to) | 2398-2400 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 82 |
Issue number | 15 |
DOIs | |
State | Published - Apr 14 2003 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)