Epitaxial Ge thin film Growth on Si Using a Cost-Effective Process in Simplified CVD Reactor

Jignesh Vanjaria, Arul Chakkaravarthi Arjunan, Yanze Wu, Gary S. Tompa, Hongbin Yu

    Research output: Contribution to journal › Article › peer-review

    3 Scopus citations

    Fingerprint

    Dive into the research topics of 'Epitaxial Ge thin film Growth on Si Using a Cost-Effective Process in Simplified CVD Reactor'. Together they form a unique fingerprint.

    Engineering & Materials Science

    Chemical Compounds