Electron emission measurements from CVD diamond surfaces

S. P. Bozeman, P. K. Baumann, B. L. Ward, M. J. Powers, J. J. Cuomo, R. J. Nemanich, D. L. Dreifus

Research output: Contribution to journalArticle

37 Scopus citations

Abstract

Electron emission measurements on diamond films synthesized by chemical vapor deposition are reported. UV photoemission spectroscopy indicates that the samples exhibit a negative electron affinity after exposure to hydrogen plasma. Secondary electron emission yields vary from 2.2 to 9.2. Field emission current-voltage measurements indicate threshold voltages ranging from 28 to 84 V μm-1. The film with the highest secondary yield also exhibits the lowest emission threshold.

Original languageEnglish (US)
Pages (from-to)802-806
Number of pages5
JournalDiamond and Related Materials
Volume5
Issue number6-8
DOIs
StatePublished - May 1996

Keywords

  • CVD diamond
  • Field emission
  • Secondary electron yield
  • UV photoelectron spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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    Bozeman, S. P., Baumann, P. K., Ward, B. L., Powers, M. J., Cuomo, J. J., Nemanich, R. J., & Dreifus, D. L. (1996). Electron emission measurements from CVD diamond surfaces. Diamond and Related Materials, 5(6-8), 802-806. https://doi.org/10.1016/0925-9635(95)00417-3