Electrodeposition of Ni3S2 for photovoltaic applications: Colloidal sulfur stabilization by gelatin

Munteha Pac, Xiaofei Han, Meng Tao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Electrodeposition of Ni3S2 with significantly improved uniformity and adhesion to F-doped SnO2 substrate is reported. Ni3S2 films of about 1 μm thickness were deposited from an aqueous solution containing NiSO4, Na 2S2O3 and gelatin. Gelatin is found to stabilize the size of colloidal sulfur to ∼260 nm, keeping the electroactive sulfur concentration stable during the deposition. Other deposition parameters such as NiSO4 concentration, bath temperature and deposition potential are found to have a profound effect on film morphology and adhesion. Ni3S2 films with a uniform composition across the entire substrate can be deposited from a solution containing 0.013M NiSO4, 0.5M Na2S2O3, 8.8×10-4 wt% gelatin at 60°C temperature, pH 4.7 and -0.4V deposition potential.

Original languageEnglish (US)
Title of host publicationPhotovoltaics for the 21st Century 7
PublisherElectrochemical Society Inc.
Pages157-166
Number of pages10
Edition4
ISBN (Electronic)9781607682585
ISBN (Print)9781566779043
DOIs
StatePublished - 2011
Externally publishedYes
EventPhotovoltaics for the 21st Century 7 - 220th ECS Meeting - Boston, MA, United States
Duration: Oct 9 2011Oct 14 2011

Publication series

NameECS Transactions
Number4
Volume41
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherPhotovoltaics for the 21st Century 7 - 220th ECS Meeting
Country/TerritoryUnited States
CityBoston, MA
Period10/9/1110/14/11

ASJC Scopus subject areas

  • Engineering(all)

Fingerprint

Dive into the research topics of 'Electrodeposition of Ni<sub>3</sub>S<sub>2</sub> for photovoltaic applications: Colloidal sulfur stabilization by gelatin'. Together they form a unique fingerprint.

Cite this