Electrodeposition of Ni 3S 2 for photovoltaic applications: Colloidal sulfur stabilization by gelatin

Munteha Pac, Xiaofei Han, Meng Tao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Electrodeposition of Ni 3S 2 with significantly improved uniformity and adhesion to F-doped SnO 2 substrate is reported. Ni 3S 2 films of about 1 μm thickness were deposited from an aqueous solution containing NiSO 4, Na 2S 2O 3 and gelatin. Gelatin is found to stabilize the size of colloidal sulfur to ∼260 nm, keeping the electroactive sulfur concentration stable during the deposition. Other deposition parameters such as NiSO 4 concentration, bath temperature and deposition potential are found to have a profound effect on film morphology and adhesion. Ni 3S 2 films with a uniform composition across the entire substrate can be deposited from a solution containing 0.013M NiSO 4, 0.5M Na 2S 2O 3, 8.8×10 -4 wt% gelatin at 60°C temperature, pH 4.7 and -0.4V deposition potential.

Original languageEnglish (US)
Title of host publicationPhotovoltaics for the 21st Century 7
Pages157-166
Number of pages10
Edition4
DOIs
StatePublished - Dec 1 2011
EventPhotovoltaics for the 21st Century 7 - 220th ECS Meeting - Boston, MA, United States
Duration: Oct 9 2011Oct 14 2011

Publication series

NameECS Transactions
Number4
Volume41
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherPhotovoltaics for the 21st Century 7 - 220th ECS Meeting
CountryUnited States
CityBoston, MA
Period10/9/1110/14/11

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Pac, M., Han, X., & Tao, M. (2011). Electrodeposition of Ni 3S 2 for photovoltaic applications: Colloidal sulfur stabilization by gelatin. In Photovoltaics for the 21st Century 7 (4 ed., pp. 157-166). (ECS Transactions; Vol. 41, No. 4). https://doi.org/10.1149/1.3628621