Electrochemical nanoimprinting of silicon: A direct patterning approach

Engineering & Materials Science

• Lithography 100%
• Silicon 72%
• Etching 65%
• Masks 57%
• III-V semiconductors 50%
• Optical materials 49%
• Dry etching 44%
• Amorphous silicon 41%
• Silicon wafers 36%
• Electron beams 36%
• Molds 35%
• Single crystals 35%
• Optics 31%
• Mirrors 31%
• Aspect ratio 28%
• Semiconductor materials 27%
• Infrared radiation 26%
• Catalysts 25%
• Surface roughness 25%
• Scalability 24%
• Polymers 22%

Chemical Compounds

• Etching 82%
• Semiconductor 46%
• Amorphous Silicon 41%
• Chemical Species 33%
• Electron Beam 33%
• Surface Roughness 30%
• Single Crystalline Solid 21%
• Surface 19%
• Diffusion 18%
• Porosity 17%
• Catalyst 12%