Electrochemical nanoimprinting of silicon

Aliaksandr Sharstniou, Stanislau Niauzorau, Placid M. Ferreira, Bruno P. Azeredo

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Scalable nanomanufacturing enables the commercialization of nanotechnology, particularly in applications such as nanophotonics, silicon photonics, photovoltaics, and biosensing. Nanoimprinting lithography (NIL) was the first scalable process to introduce 3D nanopatterning of polymeric films. Despite efforts to extend NIL's library of patternable media, imprinting of inorganic semiconductors has been plagued by concomitant generation of crystallography defects during imprinting. Here, we use an electrochemical nanoimprinting process-called Mac-Imprint-for directly patterning electronic-grade silicon with 3D microscale features. It is shown that stamps made of mesoporous metal catalysts allow for imprinting electronic-grade silicon without the concomitant generation of porous silicon damage while introducing mesoscale roughness. Unlike most NIL processes, Mac-Imprint does not rely on plastic deformation, and thus, it allows for replicating hard and brittle materials, such as silicon, from a reusable polymeric mold, which can be manufactured by almost any existing microfabrication technique.

Original languageEnglish (US)
Pages (from-to)10264-10269
Number of pages6
JournalProceedings of the National Academy of Sciences of the United States of America
Volume116
Issue number21
DOIs
StatePublished - 2019

Keywords

  • 3D silicon micromachining
  • metal-assisted chemical etching
  • microfabrication
  • nanoimprinting
  • silicon photonics

ASJC Scopus subject areas

  • General

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