Electrical and chemical characterization of chemically passivated silicon surfaces

Bhumika Chhabra, Sefik Suzer, Robert L. Opila, Christiana Honsberg

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The surface composition of chemically passivated silicon substrates is investigated using XPS and FTIR techniques. The samples are passivated with methanol, quinhydrone-methanol and iodine-methanol solution after HF treatment. The minority carrier lifetimes of these chemically passivated silicon substrates are also measured. Quinhydrone-methanol solution provides a chemically inert surface and a considerably longer minority carrier lifetime.

Original languageEnglish (US)
Title of host publicationConference Record of the IEEE Photovoltaic Specialists Conference
DOIs
StatePublished - 2008
Externally publishedYes
Event33rd IEEE Photovoltaic Specialists Conference, PVSC 2008 - San Diego, CA, United States
Duration: May 11 2008May 16 2008

Other

Other33rd IEEE Photovoltaic Specialists Conference, PVSC 2008
CountryUnited States
CitySan Diego, CA
Period5/11/085/16/08

Fingerprint

Methanol
Silicon
Carrier lifetime
Substrates
Iodine
Surface structure
X ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering

Cite this

Chhabra, B., Suzer, S., Opila, R. L., & Honsberg, C. (2008). Electrical and chemical characterization of chemically passivated silicon surfaces. In Conference Record of the IEEE Photovoltaic Specialists Conference [4922673] https://doi.org/10.1109/PVSC.2008.4922673

Electrical and chemical characterization of chemically passivated silicon surfaces. / Chhabra, Bhumika; Suzer, Sefik; Opila, Robert L.; Honsberg, Christiana.

Conference Record of the IEEE Photovoltaic Specialists Conference. 2008. 4922673.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Chhabra, B, Suzer, S, Opila, RL & Honsberg, C 2008, Electrical and chemical characterization of chemically passivated silicon surfaces. in Conference Record of the IEEE Photovoltaic Specialists Conference., 4922673, 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008, San Diego, CA, United States, 5/11/08. https://doi.org/10.1109/PVSC.2008.4922673
Chhabra B, Suzer S, Opila RL, Honsberg C. Electrical and chemical characterization of chemically passivated silicon surfaces. In Conference Record of the IEEE Photovoltaic Specialists Conference. 2008. 4922673 https://doi.org/10.1109/PVSC.2008.4922673
Chhabra, Bhumika ; Suzer, Sefik ; Opila, Robert L. ; Honsberg, Christiana. / Electrical and chemical characterization of chemically passivated silicon surfaces. Conference Record of the IEEE Photovoltaic Specialists Conference. 2008.
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