TY - GEN
T1 - Efficient coupling of Monte Carlo and level set methods for topography simulation
AU - Ertl, O.
AU - Heitzinger, C.
AU - Selberherr, S.
PY - 2007
Y1 - 2007
N2 - We have developed a topography simulation method which combines advanced level set techniques for surface evolution with Monte Carlo flux calculation. The result is an algorithm with an overall complexity and storage requirement scaling like O(NlogN) with surface disretization. The calculation of particle trajectories is highly optimized, since spatial partitioning is used to accelerate ray tracing. The method is demonstrated on Si etching in SF 6/O2 plasma.
AB - We have developed a topography simulation method which combines advanced level set techniques for surface evolution with Monte Carlo flux calculation. The result is an algorithm with an overall complexity and storage requirement scaling like O(NlogN) with surface disretization. The calculation of particle trajectories is highly optimized, since spatial partitioning is used to accelerate ray tracing. The method is demonstrated on Si etching in SF 6/O2 plasma.
UR - http://www.scopus.com/inward/record.url?scp=70350738056&partnerID=8YFLogxK
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U2 - 10.1007/978-3-211-72861-1_101
DO - 10.1007/978-3-211-72861-1_101
M3 - Conference contribution
AN - SCOPUS:70350738056
SN - 9783211728604
T3 - 2007 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2007
SP - 417
EP - 420
BT - 2007 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2007
PB - Springer-Verlag Wien
T2 - 12th International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2007
Y2 - 25 September 2007 through 27 September 2007
ER -