TY - GEN
T1 - Efficacy of the thermalized effective potential approach for modeling nano-devices
AU - Ahmed, Shaikh S.
AU - Ringhofer, Christian
AU - Vasileska, Dragica
PY - 2005/1/1
Y1 - 2005/1/1
N2 - The efficacy of the thermalized parameter-free effective potential approach described elsewhere is examined with regard to its application to modeling of alternative device technologies. Our investigations suggest that the Hartree correction is significant only for very high doping densities, as it is the case in deca-nano MOSFETs. For low doping densities, as it is usually the case in alternative device structures, such as dual-gate and FinFET devices, the Hartree term can be neglected and the Barrier term needs to be included in the model only. Since the Barrier field is pre-calculated in the initialization stages of device simulation, it does not add any additional computational cost, thus leading to a very effective way of including quantum mechanical spacequantization effects in the computational model.
AB - The efficacy of the thermalized parameter-free effective potential approach described elsewhere is examined with regard to its application to modeling of alternative device technologies. Our investigations suggest that the Hartree correction is significant only for very high doping densities, as it is the case in deca-nano MOSFETs. For low doping densities, as it is usually the case in alternative device structures, such as dual-gate and FinFET devices, the Hartree term can be neglected and the Barrier term needs to be included in the model only. Since the Barrier field is pre-calculated in the initialization stages of device simulation, it does not add any additional computational cost, thus leading to a very effective way of including quantum mechanical spacequantization effects in the computational model.
UR - http://www.scopus.com/inward/record.url?scp=33845906602&partnerID=8YFLogxK
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U2 - 10.1109/sispad.2005.201520
DO - 10.1109/sispad.2005.201520
M3 - Conference contribution
AN - SCOPUS:33845906602
SN - 4990276205
SN - 9784990276201
T3 - International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
SP - 251
EP - 254
BT - 2005 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2005
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2005 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2005
Y2 - 1 September 2005 through 3 September 2005
ER -