Heterojunction solar cells have potential for very high device voltages and currents, yet this relies on correct preparation of wafer surfaces prior to amorphous silicon (a-Si) deposition. This paper investigates the preparation of wafer surfaces by NaOH texturing and thinning prior to a-Si intrinsic layer deposition. It is found that with a CP etch or low-temperature anneal, and with correct deposition parameters, effective wafer lifetimes in excess of 1 ms can be achieved, indicating excellent surface passivation. Low reflectance achieved following wafer texturing along with high wafer lifetime led to efficiencies in finished devices as high as 17.6%.
- HIT cells
- Surface treatments
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films