Abstract

The effect of substrate patterning on hydroxyapatite (HA) sol-gel thin film growth is investigated. Sol-gel derived HA was spun onto wet and dry etched micro-patterned titanium substrates to obtain thin films of thickness ~ 400 nm. The amorphous films were made crystalline by firing at temperatures ranging from 650 to 850 °C for 5 min. Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD), and atomic force microscopy (AFM) were used to characterize the films. Crystal sizes calculated from XRD data show that films on patterned substrates contained larger grains than those on un-patterned substrates. The films on wet etched substrates contained larger grains than the films on dry etched substrates. AFM results confirm XRD results. A marked difference between the films on patterned and unpatterned substrates was observed, with those on the patterned substrates being much rougher than those on the unpatterned substrates. The films inside the channels contained larger grains than those outside of channels, on the polished, unetched portion of the substrate.

Original languageEnglish (US)
Pages (from-to)5603-5608
Number of pages6
JournalThin Solid Films
Volume519
Issue number16
DOIs
StatePublished - Jun 1 2011

Keywords

  • AFM
  • Crystallite size
  • Hydroxyapatite
  • Micro-patterned substrates
  • Sol-gel
  • Spin coating
  • Substrate geometry
  • XRD

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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  • Cite this

    Mudenda, S., Streib, K. L., Adams, D., Mayer, J. W., Nemutudi, R., & Alford, T. (2011). Effect of substrate patterning on hydroxyapatite sol-gel thin film growth. Thin Solid Films, 519(16), 5603-5608. https://doi.org/10.1016/j.tsf.2011.02.067