Abstract

Multilayer structures of TiO<inf>2</inf>/Au/TiO<inf>2</inf> have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes (TCEs). The effect of Au thicknesses on optical, electrical properties and the mechanism of conduction have been discussed. The electrical conductivity of the TCEs is solely contributed by the middle metal layer. The critical thickness (t<inf>c</inf>) of the Au mid-layer to form a continuous conducting layer is 10 nm, and the multilayer has been optimized to obtain a sheet resistance of 12.2 Ω/sq and an average optical transmittance of 86% at 590 nm. The Haacke figure of merit (FOM) for t<inf>c</inf> has one of the highest FOM with 18 × 10<sup>−3</sup> Ω<sup>−1</sup>. The samples were annealed in various environments for 24 h up to 150°C.

Original languageEnglish (US)
Pages (from-to)840-844
Number of pages5
JournalJOM
Volume67
Issue number4
DOIs
StatePublished - Apr 19 2015

Fingerprint

Gold
Multilayers
Electric properties
Optical properties
Annealing
Electrodes
Indium
Sheet resistance
Opacity
Composite materials
Substrates
Sputtering
Metals
Temperature
Electric Conductivity

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)

Cite this

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title = "Effect of Gold Thickness and Annealing on Optical and Electrical Properties of TiO2/Au/TiO2 Multilayers as Transparent Composite Electrode on Flexible Substrate",
abstract = "Multilayer structures of TiO2/Au/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes (TCEs). The effect of Au thicknesses on optical, electrical properties and the mechanism of conduction have been discussed. The electrical conductivity of the TCEs is solely contributed by the middle metal layer. The critical thickness (tc) of the Au mid-layer to form a continuous conducting layer is 10 nm, and the multilayer has been optimized to obtain a sheet resistance of 12.2 Ω/sq and an average optical transmittance of 86{\%} at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOM with 18 × 10−3 Ω−1. The samples were annealed in various environments for 24 h up to 150°C.",
author = "Aritra Dhar and Zhao Zhao and Terry Alford",
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T1 - Effect of Gold Thickness and Annealing on Optical and Electrical Properties of TiO2/Au/TiO2 Multilayers as Transparent Composite Electrode on Flexible Substrate

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AU - Zhao, Zhao

AU - Alford, Terry

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N2 - Multilayer structures of TiO2/Au/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes (TCEs). The effect of Au thicknesses on optical, electrical properties and the mechanism of conduction have been discussed. The electrical conductivity of the TCEs is solely contributed by the middle metal layer. The critical thickness (tc) of the Au mid-layer to form a continuous conducting layer is 10 nm, and the multilayer has been optimized to obtain a sheet resistance of 12.2 Ω/sq and an average optical transmittance of 86% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOM with 18 × 10−3 Ω−1. The samples were annealed in various environments for 24 h up to 150°C.

AB - Multilayer structures of TiO2/Au/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes (TCEs). The effect of Au thicknesses on optical, electrical properties and the mechanism of conduction have been discussed. The electrical conductivity of the TCEs is solely contributed by the middle metal layer. The critical thickness (tc) of the Au mid-layer to form a continuous conducting layer is 10 nm, and the multilayer has been optimized to obtain a sheet resistance of 12.2 Ω/sq and an average optical transmittance of 86% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOM with 18 × 10−3 Ω−1. The samples were annealed in various environments for 24 h up to 150°C.

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