Effect of Deposition Parameters on Exchange Bias Studied Using Lorentz and High-Resolution Electron Microscopy

B. Ramadurai, David Smith

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

The effects of key deposition parameters on NiO-Py and NiMn-Py bilayers have been systematically investigated, which include the: 1) effect of annealing; 2) partial pressure of N2 during permalloy deposition; and 3) presence or absence of Ta buffer layer. The 7% N2 partial pressure induced (200) growth, whereas its absence during Ni81Fe 19(Py) deposition induced (111) growth. The presence of Ta in conjunction with N2 partial pressure controlled the growth and orientation of the exchange-bias layer. Lorentz microscopy was used to investigate the magnetic-domain reversal mechanisms and a high-resolution electron microscopy was used to correlate microstructure with magnetic behavior.

Original languageEnglish (US)
Pages (from-to)2732-2734
Number of pages3
JournalIEEE Transactions on Magnetics
Volume39
Issue number5 II
DOIs
StatePublished - Sep 1 2003

Keywords

  • Antiferromagnet
  • Exchange bias (EB)
  • High-resolution electron microscopy (HREM)
  • Lorentz microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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