Effect of catalyst shape and etchant composition on etching direction in metal-assisted chemical etching of silicon to fabricate 3D nanostructures

Owen James Hildreth, Wei Lin, Ching Ping Wong

Research output: Contribution to journalArticle

106 Citations (Scopus)

Abstract

Metal-assisted chemical etching (MaCE) of silicon in conjunction with shaped catalysts was used to fabricate 3D nanostructures such as sloping channels, cycloids, and spirals along with traditional vertical channels. The investigation used silver nanorods, nanodonuts along with electron beam lithography (EBL)-patterned gold nanodiscs, nanolines, squares, grids, and star-shaped catalysts to show how catalyst shape and line width directly influence etching direction. Feature sizes ranging from micrometers down to 25 nm were achieved with aspect ratios of at least 10:1 and wall roughness of 10 nm or less. This research demonstrates the potential of MaCE as a new, maskless nanofabrication technology.

Original languageEnglish (US)
Pages (from-to)4033-4042
Number of pages10
JournalACS Nano
Volume3
Issue number12
DOIs
StatePublished - Dec 22 2009
Externally publishedYes

Fingerprint

etchants
Silicon
Etching
Nanostructures
Metals
etching
catalysts
Catalysts
silicon
Chemical analysis
cycloids
metals
Electron beam lithography
nanofabrication
Nanorods
Nanotechnology
Silver
Gold
Linewidth
nanorods

Keywords

  • 3D nanostructures
  • Etching
  • Metal-assisted chemical etching
  • Nanofabrication
  • Silicon

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)
  • Physics and Astronomy(all)

Cite this

Effect of catalyst shape and etchant composition on etching direction in metal-assisted chemical etching of silicon to fabricate 3D nanostructures. / Hildreth, Owen James; Lin, Wei; Wong, Ching Ping.

In: ACS Nano, Vol. 3, No. 12, 22.12.2009, p. 4033-4042.

Research output: Contribution to journalArticle

@article{d604678778884e60b00b8092e6d1a39e,
title = "Effect of catalyst shape and etchant composition on etching direction in metal-assisted chemical etching of silicon to fabricate 3D nanostructures",
abstract = "Metal-assisted chemical etching (MaCE) of silicon in conjunction with shaped catalysts was used to fabricate 3D nanostructures such as sloping channels, cycloids, and spirals along with traditional vertical channels. The investigation used silver nanorods, nanodonuts along with electron beam lithography (EBL)-patterned gold nanodiscs, nanolines, squares, grids, and star-shaped catalysts to show how catalyst shape and line width directly influence etching direction. Feature sizes ranging from micrometers down to 25 nm were achieved with aspect ratios of at least 10:1 and wall roughness of 10 nm or less. This research demonstrates the potential of MaCE as a new, maskless nanofabrication technology.",
keywords = "3D nanostructures, Etching, Metal-assisted chemical etching, Nanofabrication, Silicon",
author = "Hildreth, {Owen James} and Wei Lin and Wong, {Ching Ping}",
year = "2009",
month = "12",
day = "22",
doi = "10.1021/nn901174e",
language = "English (US)",
volume = "3",
pages = "4033--4042",
journal = "ACS Nano",
issn = "1936-0851",
publisher = "American Chemical Society",
number = "12",

}

TY - JOUR

T1 - Effect of catalyst shape and etchant composition on etching direction in metal-assisted chemical etching of silicon to fabricate 3D nanostructures

AU - Hildreth, Owen James

AU - Lin, Wei

AU - Wong, Ching Ping

PY - 2009/12/22

Y1 - 2009/12/22

N2 - Metal-assisted chemical etching (MaCE) of silicon in conjunction with shaped catalysts was used to fabricate 3D nanostructures such as sloping channels, cycloids, and spirals along with traditional vertical channels. The investigation used silver nanorods, nanodonuts along with electron beam lithography (EBL)-patterned gold nanodiscs, nanolines, squares, grids, and star-shaped catalysts to show how catalyst shape and line width directly influence etching direction. Feature sizes ranging from micrometers down to 25 nm were achieved with aspect ratios of at least 10:1 and wall roughness of 10 nm or less. This research demonstrates the potential of MaCE as a new, maskless nanofabrication technology.

AB - Metal-assisted chemical etching (MaCE) of silicon in conjunction with shaped catalysts was used to fabricate 3D nanostructures such as sloping channels, cycloids, and spirals along with traditional vertical channels. The investigation used silver nanorods, nanodonuts along with electron beam lithography (EBL)-patterned gold nanodiscs, nanolines, squares, grids, and star-shaped catalysts to show how catalyst shape and line width directly influence etching direction. Feature sizes ranging from micrometers down to 25 nm were achieved with aspect ratios of at least 10:1 and wall roughness of 10 nm or less. This research demonstrates the potential of MaCE as a new, maskless nanofabrication technology.

KW - 3D nanostructures

KW - Etching

KW - Metal-assisted chemical etching

KW - Nanofabrication

KW - Silicon

UR - http://www.scopus.com/inward/record.url?scp=73849091611&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=73849091611&partnerID=8YFLogxK

U2 - 10.1021/nn901174e

DO - 10.1021/nn901174e

M3 - Article

C2 - 19954171

AN - SCOPUS:73849091611

VL - 3

SP - 4033

EP - 4042

JO - ACS Nano

JF - ACS Nano

SN - 1936-0851

IS - 12

ER -