The downstream oxygen etching characteristics of polymers from the parylene family were discussed. The apparent activation energy for the etch process of the three types of parylene: parylene-N, patylene-C and parylene AF-4, was also discussed. It was found out that a likely rate-limiting step in the etching was the ring opening process.
|Original language||English (US)|
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Jul 1 2003|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering