Directed 2D-to-3D pattern transfer method for controlled fabrication of topologically complex 3D features in silicon

Konrad Rykaczewski, Owen J. Hildreth, Ching P. Wong, Andrei G. Fedorov, John Henry J. Scott

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

A process that allows control over the 3D motion of catalyst nanostructures during metal-assisted chemical etching by their local pinning prior to etching is demonstrated. The pinning material acts as a fulcrum for rotation of the catalyst structures resulting in etching of silicon features with rotational geometry.

Original languageEnglish (US)
Pages (from-to)659-663
Number of pages5
JournalAdvanced Materials
Volume23
Issue number5
DOIs
StatePublished - Feb 1 2011

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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