Direct metal nano-imprinting using an embossed solid electrolyte stamp

A. Kumar, K. H. Hsu, K. E. Jacobs, P. M. Ferreira, N. X. Fang

Research output: Contribution to journalArticle

17 Scopus citations

Abstract

In this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates - analogous to polymer patterning in nano-imprint lithography - is explored. Silver sulfide (Ag2S) - a superionic conductor with excellent microforming properties - is investigated as a candidate material. Important parameters of the superionic stamp, including mechanical behavior, material flow during forming and feature recovery after embossing, are studied. Excellent feature transferability during embossing as well as etching is observed. To illustrate the capability of this approach silver nano-antennas with gaps < 10nm were successfully fabricated. The possibility for large area patterning with stamp diameters > 6mm is also demonstrated. Embossing-based metal patterning allows fabrication beyond two-dimensional nanofabrication and several patterning schemes are reported.

Original languageEnglish (US)
Article number155302
JournalNanotechnology
Volume22
Issue number15
DOIs
StatePublished - Apr 15 2011

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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    Kumar, A., Hsu, K. H., Jacobs, K. E., Ferreira, P. M., & Fang, N. X. (2011). Direct metal nano-imprinting using an embossed solid electrolyte stamp. Nanotechnology, 22(15), [155302]. https://doi.org/10.1088/0957-4484/22/15/155302