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Diffusion profiles beneath silicon heterojunction contacts reduce contact resistivity and increase efficiency
William Weigand, Pradyumna Muralidharan, Daniel Chen, Anastasia Soeriyadi, Bruno Vicari Stefani, Brett Hallam, Stephen M. Goodnick, Zhengshan J. Yu, Zachary C. Holman
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution